Taiwan Semiconductor Manufacturing Comp. Ltd.

China Petrochemical Development Corporation

Ying-Chih Lin

Jeng-Horng Chen

Chien-Chih Chen

Shu-Hao Chang

Kuo-Chang Kau

Pi-Yeh Chia

Chi-Ren Chen

Yeong-Cheong Lee

Provided is a material composition and method for that includes providing a substrate and forming a resist layer over the substrate. In various embodiments, the resist layer includes a multi-metal complex including an extreme ultraviolet (EUV) absorption element and a bridging element. By way of example, the EUV absorption element includes a first metal type and the bridging element includes a second metal type. In some embodiments, an exposure process is performed to the resist layer. After performing the exposure process, the exposed resist layer is developed to form a patterned resist layer.

Material composition and methods thereof

This invention relates to an improved process for synthesizing carboxylic acids by the carbonylation of alcohol. An alcohol such as methanol is reacted with carbon monoxide in a liquid reaction medium containing a rhodium (Rh) catalyst stabilized with an haloacetic acid, especially trifluoroacetic acid (TFAA), along with alkyl iodide such as methyl iodide (MeI) in specified proportions. The present reaction system is not only characterized by unexpectedly high catalyst stability, but also characterized by the high reaction rate for the formation of acetic acid. The improvement resides in the employment of trifluoroacetic acid as the catalyst promoter at a temperature from 180.degree. C. to 200.degree. C. The primary advantage of the catalyst system of this invention is the enhancement of the rate of carbonylation. The other advantage of the catalyst system is that they are readily soluble and thermally stable, making them resistant to deposition.

Production of carboxylic acids from carbonylation of alcohol

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Taipei, Taiwan

Ying-Chih Lin