Linco Technology Co., Ltd.

Yi-Yuan Huang

Chung-Yu Yeh

Cheng-Peng Yeh

Tsung-Wei Chang

Wan-Yu Huang

Huei-Chia Su

Mu-Sen Lu

Yi-Cheng Liu

A substrate processing apparatus comprises a chamber member that defines an interior volume that has an aspect ratio. The chamber member comprises a pair of laterally opposing inlet walls and a loading port. Each of the pair of laterally opposing inlet walls has an inlet port configured to receive output from a remote plasma source. The loading port is arranged between the pair of inlet walls, configured to allow passage of a substrate into the interior volume.

Substrate processing apparatus

A substrate carrier unit includes a substrate carrier and a phase transition material. The substrate carrier defines an isolated space therein. The phase transition material is filled into the isolated space of the substrate carrier and has a melting point ranging between 18&#xb0; C. and 95&#xb0; C. The phase transition material is capable of absorbing thermal energy from the substrate carrier as latent heat to change the phase from solid to liquid.

Substrate carrier unit for a film deposition apparatus

A film deposition system includes a substrate carrier, a film deposition device, a transport device and a cooling device. The substrate carrier includes a carrier body that defines an isolated space therein, and a phase transition material that is filled into the isolated space and that has a melting point ranging between 18&#xb0; C. and 95&#xb0; C. The phase transition material is capable of absorbing thermal energy from the carrier body as latent heat to change the phase of the phase transition material from solid to liquid. The cooling device is configured to absorb thermal energy from the substrate carrier so as to change the phase of the phase transition material from liquid to solid.

Film deposition system having a substrate carrier and a cooling device

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Taichung, Taiwan

Yi-Yuan Huang