Taiwan Semiconductor Manufacturing Comp. Ltd.

Yi-Tsang Chen

Yung-Long Chen

I-Chen Chiang

Hwai-Te Chiu

Chih-Chiang Tseng

A slurry dispersion system is provided, and includes a slurry source system, an in-line analyzer and a controller. The slurry source system provides a slurry for a chemical mechanical polishing (CMP) process. The in-line analyzer measures at least one parameter of a sampled slurry sampled from the slurry dispersion system, and generates an indication signal based on the parameter, in which the indication signal indicates at lease one characteristic of the slurry. The controller receives the indication signal, and generates a control signal based on the indication signal for performing a real time control on the slurry dispersion system for controlling quality of the slurry.

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Taipei, Taiwan

Yi-Tsang Chen