United Microelectronics Corp.

Yi-Ning He

Tien-Hao Tang

Lu-An Chen

Kuan-Cheng Su

Jhih-Ming Wang

A semiconductor device is includes a substrate, a gate positioned on the substrate, and a drain region and a source region formed at two respective sides of the gate in the substrate. The drain region includes a first doped region having a first conductivity type, a second doped region having a second conductivity type, and a third doped region. The first conductivity type and the second conductivity type are complementary to each other. The semiconductor device further includes a first well region formed under the first doped region, a second well region formed under the second doped region, and a third well region formed under the third doped region. The first well region, the second well region, and the third well region all include the first conductivity type. A concentration of the second well region is different from a concentration of the third well region.

Semiconductor device

A semiconductor device includes a substrate, a gate positioned on the substrate, a drain and a source formed in the substrate at respective two sides of the gate, and a doped region formed in the source. The drain and the source comprise a first conductivity type and the doped region comprises a second conductivity type. The first conductivity type and the second conductivity type are complementary to each other.

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Taichung, Taiwan

Yi-Ning He