Taiwan Semiconductor Manufacturing Comp. Ltd.

Yi-Hsun Chiu

Shang-Wen Chang

Yi-Hsiung Lin

Chih-Hao Wang

Ching-Wei Tsai

Cheng-Chi Chuang

Yu-Xuan Huang

Yih Wang

Chih-Liang Chen

Chia-En Huang

Huan-Chieh Su

Chun-Yuan Chen

Jiann-Tyng Tzeng

Meng-Sheng Chang

Hui-Zhong Zhuang

Kam-Tou Sio

Pei-Yu Wang

Kuan-Lun Cheng

Li-Zhen Yu

Jia-Chuan You

Wai-Yi Lien

Charles Chew-Yuen Young

Wei-Cheng Lin

Guo-Huei Wu

Yi-Bo Liao

Jhon Jhy Liaw

Yu-Ming Lin

Li-Chun Tien

Ting-Wei Chiang

Shih-Wei Peng

Hidehiro Fujiwara

Wei-Hao Wu

Shun Li Chen

Wei-An Lai

Chih-Chao Chou

Ren-Dou Lee

Chien-Wei Chang

Yuan-Hsin Chi

Ming Chian Tsai

Ya-Jen Sheuh

Yi-Chih Chang

Ru-Gun Liu

Chih-Ming Lai

Chung-Hsing Wang

Lin-Yu Huang

Ta-Pen Guo

Hou-Yu Chen

Chung-Cheng Wu

Yuan-Te Hou

Chi-Yu Lu

Chyi-Tsong Ni

Chih-Yu Lai

Chia-en Huang

Ching-Hou Su

Hou-yu Chen

Shang-Hsuan Chiu

I-shi Wang

Guo-Yung Chen

An IC structure includes a first transistor, first gate spacers, a second transistor, second gate spacers, a backside metal line, and a metal contact. The first transistor includes first source/drain regions and a first gate structure between the first source/drain regions. The first gate spacers space apart the first source/drain regions from the first gate structure. The second transistor comprises second source/drain regions and a second gate structure between the second source/drain regions. The second gate spacers space apart the second source/drain regions from the second gate structure. The first gate spacers and the second gate spacers extend along a first direction. The backside metal line extends between the first transistor and the second transistor along a second direction. The first metal contact wraps around one of the second source/drain regions and has a protrusion interfacing the backside metal line.

Integrated circuit structure with backside via rail

Semiconductor device including a first transistor structure; a first interconnect structure on a front-side of the first transistor structure; and a second interconnect structure on a backside of the first transistor structure, the second interconnect structure including a first dielectric layer on the backside of the first transistor structure; a contact extending through the first dielectric layer to a source/drain region of the first transistor structure; and first spacers along sidewalls of the contact between the contact and the first dielectric layer, sidewalls of the first spacers facing the first dielectric layer being aligned with sidewalls of the source/drain region of the first transistor structure.

Semiconductor transistor devices having double-sided interconnect structures

Methods of forming dual-side super power rails in semiconductor devices, semiconductor devices including the same, and methods of testing the semiconductor devices are disclosed. In an embodiment, a device includes a transistor structure; a front-side interconnect structure on a front side of the transistor structure; and a back-side interconnect structure on a back side of the transistor structure. The front-side interconnect structure includes a front-side power delivery network (PDN) and a front-side input/output (I/O) pin. The back-side interconnect structure includes a back-side PDN.

Dual-side power rail design and method of making same

An integrated circuit (IC) includes a first p-type semiconductor fin, a first dielectric fin, a first hybrid fin, a second hybrid fin, a second dielectric fin, and a second p-type semiconductor fin disposed in this order along a first direction and oriented lengthwise along a second direction, where each of the first and the second hybrid fins has a first portion including an n-type semiconductor material and a second portion including a dielectric material. The IC further includes n-type source/drain (S/D) epitaxial features disposed over each of the first and the second p-type semiconductor fins, p-type S/D epitaxial features disposed over the first portion of each of the first and the second hybrid fins, and S/D contacts physically contacting each of the p-type S/D epitaxial features and the second portion of each of the first and the second hybrid fins.

FinFET SRAM cells with reduced fin pitch

A semiconductor device is provided. The semiconductor device has a stack of parallel metal gates formed on a first side of a substrate, a first pair of insulation regions extending across the stack of parallel metal gates, a second pair of insulation regions replacing two of the parallel metal gates, a first isolated region enclosed by the first and second pairs of insulation layers, a first via formed within the isolated region, and an insulation layer replacing the metal gates located within the isolated region. Tree or more metal gates are located within the isolated region, and the first via extends through a portion of a center one of the three metal gates within the isolated region.

Semiconductor device and method of manufacturing the same

A semiconductor device structure is provided. The semiconductor device structure includes a first epitaxial structure and a second epitaxial structure spaced apart from the first epitaxial structure. The semiconductor device structure also includes a conductive contact electrically connected to the first epitaxial structure and a first conductive via over the conductive contact. The semiconductor device structure further includes a second conductive via directly above the second epitaxial structure. The second conductive via is longer than the first conductive via.

Semiconductor device with contact structures

A semiconductor structure includes a first semiconductor fin and a second semiconductor fin adjacent to the first semiconductor fin. The first and the second semiconductor fins extend lengthwise along a first direction over a substrate. A metal gate structure is disposed over the first and second semiconductor fins, the metal gate structure extending lengthwise along a second direction perpendicular to the first direction. A first epitaxial source/drain (S/D) feature is disposed over the first semiconductor fin, and a second epitaxial S/D feature is disposed over the second semiconductor fin. An interlayer dielectric (ILD) layer is disposed over the first and the second epitaxial S/D features. And an S/D contact is disposed directly above the first and second epitaxial S/D features. The S/D contact directly contacts the first epitaxial S/D feature, and the S/D contact is isolated from the second epitaxial S/D feature by the ILD layer.

Methods of forming contact features in field-effect transistors

A memory device includes a memory array having a first memory cell in a first column of the memory array, a second memory cell in the first column of the memory array, a first read bit line extending in a column direction and connected to the first memory cell to read data from the first memory cell, and a second read bit line extending in the column direction and connected to the second memory cell to read data from the second memory cell.

Separated read BL scheme in 3T dram for read speed improvement

Semiconductor device and the manufacturing method thereof are disclosed herein. An exemplary semiconductor device comprises a semiconductor fin disposed over a substrate; a metal gate structure disposed over a channel region of the semiconductor fin; a first interlayer dielectric (ILD) layer disposed over a source/drain (S/D) region next to the channel region of the semiconductor fin; and a first conductive feature including a first conductive portion disposed on the metal gate structure and a second conductive portion disposed on the first ILD layer, wherein a top surface of the first conductive portion is below a top surface of the second conductive portion, a first sidewall of the first conductive portion connects a lower portion of a first sidewall of the second conductive portion.

Semiconductor device with L-shape conductive feature and methods of forming the same

Semiconductor devices and methods are provided which facilitate performing physical failure analysis (PFA) testing from a backside of the devices. In at least one example, a device is provided that includes a semiconductor device layer including a plurality of diffusion regions. A first interconnection structure is disposed on a first side of the semiconductor device layer, and the first interconnection structure includes at least one electrical contact. A second interconnection structure is disposed on a second side of the semiconductor device layer, and the second interconnection structure includes a plurality of backside power rails. Each of the backside power rails at least partially overlaps a respective diffusion region of the plurality of diffusion regions and defines openings which expose portions of the respective diffusion region at the second side of the semiconductor device layer.

Backside power rail for physical failure analysis (PFA)

Methods for improving wafer bonding performance are disclosed herein. In some embodiments, a method for bonding a pair of semiconductor substrates is disclosed. The method includes: processing at least one of the pair of semiconductor substrates, and bonding the pair of semiconductor substrates together. Each of the pair of semiconductor substrates is processed by: performing at least one chemical vapor deposition (CVD), and performing at least one chemical mechanical polishing (CMP). One of the at least one CVD is performed after all CMP performed before bonding.

Methods for wafer bonding

A semiconductor structure includes a first transistor having a first source/drain (S/D) feature and a first gate; a second transistor having a second S/D feature and a second gate; a multi-layer interconnection disposed over the first and the second transistors; a signal interconnection under the first and the second transistors; and a power rail under the signal interconnection and electrically isolated from the signal interconnection, wherein the signal interconnection electrically connects one of the first S/D feature and the first gate to one of the second S/D feature and the second gate.

Backside signal interconnection

A memory device includes a programming transistor and a reading transistor of an anti-fuse memory cell. The programming transistor includes first semiconductor nanostructures vertically spaced apart from one another, each of the first semiconductor nanostructures having a first width along a first lateral direction. The reading transistor includes second semiconductor nanostructures vertically spaced apart from one another, each of the second semiconductor nanostructures having a second width different from the first width along the second direction. The memory device also includes a first and a second gate metals. The first gate metal wraps around each of the first semiconductor nanostructures with a first gate dielectric disposed therein. The second gate metal wraps around each of the second semiconductor nanostructures with a second gate dielectric disposed therein.

Memory devices and methods of manufacturing thereof

Devices and methods are described herein that obviate the need for a read assist circuit. In one example, a semiconductor device includes a source region and a drain region formed above a substrate. A buried insulator (BI) layer is formed beneath either the source region or the drain region. A first nano-sheet is formed (i) horizontally between the source region and the drain region and (ii) vertically above the BI layer. The BI layer reduces current flow through the first nano-sheet.

Semiconductor device including a dielectric layer between a source/drain region and a substrate

A memory cell is disclosed. The memory cell includes a first transistor. The first transistor includes a first conduction channel collectively constituted by one or more first nanostructures spaced apart from one another along a vertical direction. The memory cell includes a second transistor electrically coupled to the first transistor in series. The second transistor includes a second conduction channel collectively constituted by one or more second nanostructures spaced apart from one another along the vertical direction. At least one of the one or more first nanostructures is applied with first stress by a first metal structure extending, along the vertical direction, into a first drain/source region of the first transistor.

Growing community of inventors

Zhubei, Taiwan

Yi-Hsun Chiu