Taiwan Semiconductor Manufacturing Comp. Ltd.

Yi-Hsu Chen

San-De Tzu

Chih-Chiang Tu

Dong-Hsu Cheng

Chang-Cheng Hung

Yung-Haw Liaw

Deng-Guey Juang

Chung-Sheng Lee

Jiin-Feng Yeh

Hua-Jen Chen

Jeen-Hao Liu

Jui-Ming Wang

Jeen-Haw Liu

A method for remote mask data jobview through a network featuring 24-hour service, reduced cycle time and lower cost, whereby customers can obtain real time mask data access instead of downloading entire pattern files. Expensive CAD/CAM software is unnecessary for the mask data jobview; instead, only a web browser is required. The method for remote mask data jobview through a network comprising the steps of: storing a mask data file to a jobview computer, wherein drawing software is installed on the jobview computer; logging onto a web server from a customer computer through a first network, wherein a web-based graphic mode emulator is installed on the web server; logging onto the jobview computer from the web server through a second network; using the web-base graphic mode emulator to operate the drawing software; and using a browser installed on the customer computer to operate the drawing software to open and review the mask data file.

Method for remote mask data jobview through a network

A method is described which allows certain Optical Proximity Corrections to be computed in a few minutes. This has been achieved by limiting changes to the optical mask to the addition of two sets of serifs (one larger than the other) at the appropriate vertices in the layout mask. A key feature of the method is that identification of which serifs will be within a critical distance from a neighbouring edge (and have therefore to be smaller) is performed by the application of a few simple logical operations. This results in a corrected mask that can be generated in a few minutes, as opposed to many hours.

Use of logical operations in place of OPC software

A mask pattern having an anti-ESD ring which protects the pattern region of the mask from damage due to ESD events. The anti-ESD ring has a space between two broad border regions formed of an opaque metal such as chrome. ESD fingers, or rods extend from one of the border regions to within a small gap of the other border region. These ESD fingers act as lightning rods so that ESD events preferably occur across this small gap between the ESD fingers and one of the border regions. The ESD fingers are small enough so that any metal transferred across the gap in an ESD event is very small. The gap is located so that any metal transferred is far away from the pattern region of the mask. The ESD fingers confine ESD events to a preferred region of the mask and damage to the pattern region is avoided.

Electrostatic discharge damage prevention method on masks

A mask and method of systematically laying out the mask for test patterns in the frame cell region of an attenuating phase shifting mask are described. An array of sub-resolution contact holes are used in the border regions of the mask to prevent over exposure of photoresist in the regions between the device regions on a wafer due to side lobe effect. The mask and method provide for a buffer distance surrounding the features of the test patterns. The buffer distance is free of sub-resolution contact holes. When the buffer distance is correctly chosen problems due to side lobe effect at the frame cell portion of the mask are prevented.

Method of blind border pattern layout for attenuated phase shifting masks

A mask and method of forming a mask which minimizes the light transmission in the border regions of attenuating phase shifting masks. The mask uses square contact holes formed in the attenuating phase shifting material in the border regions. The square contact holes are located at the edge of the mask pattern region beginning at each corner of the mask pattern region and working toward the center of each side of the mask pattern region using a contact hole pitch. At the center of each side of the mask pattern region the pitch is discontinuous and a row of rectangular contact holes are formed.

Growing community of inventors

Hsinchu, Taiwan

Yi-Hsu Chen