United Microelectronics Corp.

Yi-Ham Tsou

Jeng-Ho Wang

Hsin-Yi Lu

Yung-Chieh Kuo

Yan-Home Liu

Cheng-Wei Chen

A reworking method for integrated circuit devices includes the following: providing a substrate having a first base layer and a first dielectric layer formed thereon, performing a first dry etching process to remove the first dielectric layer, performing a CMP process to remove the first base layer, and sequentially reforming a second base layer and a second dielectric layer on the substrate. When certain layers on the IC device have hailed an inspection or when quality defects are found, the defective layer is removed according to the provided reworking method.

Growing community of inventors

Miaoli County, Taiwan

Yi-Ham Tsou