Samsung Electronics Co., Ltd.

Yeu-Young Youn

Kyoung-mi Kim

Jae-ho Kim

Shi-Yong Yi

Sang-Mun Chon

Kwang-sub Yoon

Baik-soon Choi

Sang-Kyu Park

Youn-Kyung Wang

Dae-Joung Kim

Seung-Hyun Ahn

Eun-Mi Bae

Young-Ho Kim

Jae-Ho Kim

Young-ho Kim

Boo-deuk Kim

A thinner composition includes propylene glycol ether acetate, methyl 2-hydroxy-2-methyl propionate, and an ester compound such as ethyl lactate, ethyl 3-ethoxy propionate or a mixture thereof.

Thinner composition and method of removing photoresist using the same

The photoresist composition of the present invention includes a solvent mixture, a resin, a photo acid generator, and a quencher, the solvent mixture comprising a first solvent containing an ether compound and a second solvent having a polarity stronger than the first solvent, wherein an amount of the first solvent is in a range of about 61% to about 79% by weight, and an amount of the second solvent is in a range of about 21% to about 39% by weight based on a total weight of the solvent mixture.

Photoresist composition and method of forming a pattern using the same

A photoresist composition for preventing exposing failures and a method of forming a pattern using the same are disclosed. The photoresist composition preferably comprises about 0.1% to about 0.5% by weight of a photo acid generator, and about 2% to about 10% by weight of a polymer resin, the PAG including a monophenyl sulfonium compound, a triphenyl sulfonium compound or a mixture thereof. The footing phenomenon and the top loss of a pattern are sufficiently prevented.

Photoresist composition and method of forming a pattern using same

An adhesive compound for use with a photoresist, the compound represented in accordance with the following chemical formula, A method for forming a photoresist pattern using the adhesive compound is also disclosed.

Silazane compound amd methods for using the same

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Seoul, South Korea

Yeu-Young Youn