Canon Kabushiki Kaisha

Canon Nanotechnologies, Inc.

Yeshwanth Srinivasan

Seth J Bamesberger

Philip D Schumaker

Frank Y Xu

Gerard M Schmid

Niyaz Khusnatdinov

Takuro Yamazaki

Weijun Liu

Edward Brian Fletcher

Van Nguyen Truskett

Sentaro Aihara

Se-Hyuk Im

Matthew C Traub

Masahiro Tamura

Tom H Rafferty

Whitney Longsine

Steven Wayne Burns

Methods and systems for dispensing fluid in imprint lithography, including selecting drop patterns, each associated with different target locations on a substrate and a selected volume for each drop of each drop pattern; selecting a plurality of subsets of nozzles of a dispenser, each subset configured to dispense drops corresponding to each drop pattern; for each drop pattern: dispensing the drops corresponding to the drop pattern from each subset of nozzles; obtaining an image of the drops from each subset of nozzles; and processing the image from each subset of nozzles to determine a positional error of the drops with respect to the target locations and a volumetric error of the drops with respect to the selected volume for each drop; and adjusting, based on the positional error and the volumetric error of the drops from each subset of nozzles for each drop pattern, dispense parameters of the dispenser.

Drop placement evaluation

The present invention provides an imprint apparatus which forms a pattern of an imprint material onto a substrate by using a mold, the apparatus including a control unit configured to provide a user interface for displaying a first map indicating a supply position of the imprint material to be supplied onto the substrate, an adjustment window for adjusting a value of an apparatus parameter which is set in the imprint apparatus and used to change a supply position of the imprint material, and a second map indicating a supply position of the imprint material after adjustment of the value of the apparatus parameter.

Imprint apparatus, method of manufacturing article, information processing apparatus, method of supporting map editing, and storage medium

Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for aligning a template and a substrate, the method including obtaining a moir&#xe9; image based on an interaction of light between corresponding features of the template and the substrate, the moir&#xe9; image including a plurality of moir&#xe9; fringe strips; compressing each moir&#xe9; fringe strip of the moir&#xe9; image by an optical lens array based on a pixel height of an acquisition device, the acquisition device including one or more line scan cameras; processing the compressed moir&#xe9; image by each of the line scan cameras of the acquisition device to determine a misalignment between the template and the substrate; and based on the determined misalignment, adjusting a relative positioning between the template and the substrate.

Optical system for use in stage control

The present invention provides an imprint apparatus which forms a pattern on a substrate by molding an imprint material on the substrate using a mold, comprising a supply unit configured to supply droplets of the imprint material onto the substrate; and a processing unit configured to acquire arrangement patterns of the droplets on the substrate, wherein based on the arrangement pattern corresponding to a first portion of the mold and the arrangement pattern corresponding to a second portion of the mold, the processing unit acquires the arrangement pattern corresponding to a boundary portion between the first portion and the second portion.

Imprint apparatus, imprint method, and method of manufacturing article

Methods, systems, and apparatus for identifying a non-rectangular shape outline of a first field of a substrate, the first field directly adjacent to a second field; adjusting an exposure profile of an ultraviolet light beam based on the non-rectangular shape outline of the first field to provide a non-rectangular exposure profile of the ultraviolet light beam; disposing a polymerizable composition on the first field of the substrate; contacting the polymerizable composition in the first field with an imprint lithography template; and while contacting the polymerizable composition in the first field with the imprint lithography template, directing the ultraviolet light beam having the non-rectangular exposure profile towards the substrate such that the ultraviolet light beam irradiates only the first field of the substrate.

Method and system for controlled ultraviolet light exposure

Imprint lithography methods that incorporate depositing droplets of polymerizable material in patterns that improve fill time performance when employing directionally-oriented imprint templates. The patterns are based on grid arrays formed of repeating sets of rows of droplets oriented along fast and slow axes, with droplets of each row offset along the slow axis relative to droplets in adjacent rows.

Drop pattern generation for imprint lithography with directionally-patterned templates

Growing community of inventors

Austin, TX, United States of America

Yeshwanth Srinivasan