Vpix Medical Incorporation

Nanoprotech Co., Ltd.

K-mac

Yeong Ryeol Kim

Ji Won Kim

Kyungmin Hwang

Jin Yong Kim

Cheul Ock Chae

Hyung Lee

Joong Whan Lee

Sang Tae Kim

Soung Jin Kim

Ji Jong Park

An image generating device for obtaining an image of an object is proposed. The device may include a control module configured to generate a first signal having a first frequency component and a first phase component for a first axis direction, and a second signal having a second frequency component and a second phase component for a second axis direction. The device may also include an emitting unit configured to emit light to the object using the first signal and the second signal. The device may further include a light receiving unit configured to obtain light receiving signal based on returned light from the object.

Method and system for correcting phase of image reconstruction signal

An image generating device for obtaining an image of an object, comprising: a control module configured to generate a first signal having a first frequency component and a first phase component for a first axis direction, and a second signal having a second frequency component and a second phase component for a second axis direction, an emitting unit configured to emit light to the object using the first signal and the second signal; and a light receiving unit configured to obtain light receiving signal based on returned light from the object.

Provided are a foreign material detecting device and method for detecting only a foreign material on a surface of a substrate except for a foreign material on a lower surface of the substrate in a manufacturing process of a transparent substrate passing light therethrough, such as a glass substrate used in a flat panel display (FPD) such as a liquid crystal display (LCD), an organic light emitting diode (OLED), a plasma display panel (PDP), etc., a sapphire wafer used in some of semiconductors, or the like, and in a pattern forming process in a manufacturing process of the FPD and the semiconductor using the transparent substrate. More particularly, provided are a foreign material detecting device and method for detecting only a foreign material on a surface of an ultra-thin transparent substrate having a thickness of 0.3 T or less.

Upper surface foreign material detecting device of ultra-thin transparent substrate

Provided are an apparatus and a method of detecting a foreign material capable of detecting only a foreign material on a surface of a substrate except for a foreign material on a lower surface of the substrate in a manufacturing process of a transparent substrate passing light therethrough, such as a glass substrate used in a flat panel display (FPD) such as a liquid crystal display (LCD), an organic light emitting diode (OLED), a plasma display panel (PDP), a sapphire wafer used in some of semiconductors, or the like, and in a pattern forming process in a manufacturing process of the FPD and the semiconductor using the transparent substrate.

Method of detecting foreign material on upper surface of transparent substrate using polarized light

The present invention relates to a non-contact, non-destructive measuring apparatus that measures thickness profile and refractive index distribution of a single or multiple layers of thin films by means of the principle of reflectometry. According to the present invention, by employing more than one narrow band-pass optical filters and a two-dimensional array of CCD sensors, and by finding an optimal solution for the nonlinear functional relationship between the thickness of said thin film or thin films and the corresponding refractive indexes by using an iterative numerical computation method, said apparatus simultaneously measures local area-wise thickness profile and refractive index distribution among others of said a single layer or multiple layers of thin films on a substrate.

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Daejeon, South Korea

Yeong Ryeol Kim