Samsung Electronics Co., Ltd.

Yeondo Jung

Jongchul Park

Jeongyun Lee

Jongsoon Park

Haegeon Jung

Hyunggoo Lee

Bokyoung Lee

A semiconductor device includes a device isolation layer on a substrate; pattern groups including fin patterns extending in a first direction; and gate structures extending in a second direction to intersect the fin patterns. A first pattern group, among the pattern groups, may include first fin patterns. At least a portion of the first fin patterns may be arranged with a first pitch in the second direction. The first pattern group may include a first planar portion extending from a first recess portion. A central axis of the first recess portion may be spaced apart from a central axis of one of the first fin patterns by a first distance in the second direction. The first planar portion may have a first width in the second direction and being greater than the first pitch. The first distance may be about 0.8 times to about 1.2 times the first pitch.

Growing community of inventors

Hwaseong-si, South Korea

Yeondo Jung