Samsung Display Co., Ltd.

Yeon-Jae Lee

Min-Soo Kim

Dae-Young Lee

Tae-Jin Kim

Gug-Rae Jo

Dae-Hwan Jang

Jung-Gun Nam

Hee-Chang Yang

Eun-Ho Jung

An exposure method includes loading a first substrate on a loading portion , the first substrate having a photo alignment agent which is coated on the first substrate, irradiating the first substrate by moving the first substrate in a first speed in a first direction to a working portion while loading a second substrate on the loading portion, the working portion having an ultra violet light source generating ultra violet ray to harden a photo alignment agent, simultaneously irradiating the first substrate and the second substrate by moving the first substrate and the second substrate in the first direction in the working portion, and unloading the first substrate from an unloading portion while irradiating the second substrate by moving the second substrate in the first direction in the working portion.

Exposure apparatus and exposure method using the same

A polarizer includes a base substrate and a metal pattern disposed on the base substrate and forming a wire grid. The wire grid has a width and a height and spaced apart from adjacent wire grid by a separation distance. A pitch is a sum of the width and the separation distance. A fill factor is obtained by dividing the width by the pitch. The range of the fill factor is based on an extinction ratio of polarization and a transmittance of the polarizer.

Polarizer, polarized light illuminating apparatus having the same and method of manufacturing the same

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Suwon-si, South Korea

Yeon-Jae Lee