Lg Display Co., Ltd.

Yeon Heui Nam

Jin Wuk Kim

Tae Joon Song

Seong Pil Cho

Jin-Wuk Kim

Jun Yong Song

Myoung Soo Lee

Jin Kwan Kim

Seung Hyup Shin

Byung Uk Kim

A photosensitive resin composition and a method for forming an organic film on a substrate are provided. Because the photosensitive resin composition for imprinting includes an erythrotol-based monomer or oligomer, an organic film formed by the photosensitive resin composition for imprinting has improved restoring force. Therefore, the photosensitive resin composition is appropriate for imprinting processes.

Photosensitive resin composition for imprinting process and method for forming organic layer over substrate

A method for fabricating a mold includes the steps of forming a photo-polymerizable resin layer between a master substrate and a transparent mold substrate, wherein a first pattern is formed on the master substrate; solidifying the resin layer by exposing the resin layer to a UV light through the transparent mold substrate; and forming a mold having a second pattern by separating the resin layer from the master substrate, wherein the second pattern is in a form of a recess on the resin layer at a portion corresponding to the first pattern and the resin layer being engaged with the mold substrate.

Method of fabricating a mold

A resist composition used for the imprint lithography process, a method for forming resist pattern using the same, an array substrate manufactured using the same, and method of fabricating the array substrate includes an additive and the adhesion promoter inducing the chemical bond of the base layer contacting to the UV curable resin. As a result, it is possible for the resist composition to form a high-resolution pattern and to improve the durability of the mold for molding a UV curable resin.

Method for forming a resist pattern

An IPP resin material capable of improving the adhesive strength between a transparent electrode and an IPP resin layer is disclosed. The IPP resin material includes: a liquid pre-polymer including a mono-functional monomer, a di-functional monomer including a monomer containing an ether group, and a tri-functional monomer including pentaerythritol triacrylate; a photo initiator; and a adhesion promoter, wherein the monomer containing the ether group includes any one of poly(propylene glycol)diacrylate, poly(propylene glycol)dimethacrylate, propylene glycol diacrylate), and tri(ethylene glycol)dimethacrylate.

In-plane printing resin material and method of manufacturing liquid crystal display device using the same

A liquid-crystal display includes a first substrate and a second substrate disposed opposite the first substrate, and a plurality of pixel areas formed on the first substrate, where each pixel area has red, green, blue, and white sub-pixel areas. Red, green and blue color filter layers are disposed on the red, green and blue sub-pixel areas, respectively, and an overcoat layer is disposed over the red, green and blue color filter layers, where a portion of the overcoat layer forms a white color filter layer in the white sub-pixel area. The overcoat layer is formed from a UV-curable liquid pre-polymer material, which includes monomers each having a mono-functional group, and at least a di-functional group or a tri-functional group.

UV curable liquid pre-polymer, and liquid crystal display device using the same and manufacturing method thereof

A soft mold may be manufactured that is used for forming a pattern. Semiconductor devices and flat panel display devices include a plurality of fine patterns on a substrate. The soft mold may be photo-curable and formed of a material with a hydrophobic property similar to heat-curable molds. The photo-curable mold may be created on a master plate with a resin layer that is removed with a back plate and adhesive layer after embossed or depressed portions are formed on the mold that correspond with embossed or depressed portions of the master plate.

Soft mold and method of fabricating the same

A method for fabricating an LCD device is disclosed, in which a reliable thin film pattern is formed as process deviation is minimized. The method includes forming a thin film on a substrate; forming an etch resist solution on the thin film; applying a soft mold having a concave portion and a convex portion to the etch resist solution, wherein the convex portion includes a first width and a second width different than the first width; forming an etch resist pattern having a predetermined linewidth controlled by the pressure applied by the soft mold; hardening the etch resist pattern; separating the soft mold from the substrate; and patterning the thin film using the etch resist pattern as a mask.

Growing community of inventors

Gangwon-do, South Korea

Yeon Heui Nam