Taiwan Semiconductor Manufacturing Comp. Ltd.

Asustek Computer Inc.

Quanta Cloud Technology Inc.

Yen-Hsun Chen

Li-Jui Chen

Han-Lung Chang

Ming-Hsun Tsai

Shao-Hua Wang

Po-Chung Cheng

Tzung-Chi Fu

Chia-Chen Chen

Jhan-Hong Yeh

Yi-Zhen Chen

Ping-Cheng Li

Shang-Chieh Chien

Hsin-Feng Chen

Wei-Shin Cheng

Cheng-Hao Lai

Shih-Yu Tu

Hsiao-Lun Chang

Yu-Kuang Sun

Chia-Jui Lee

Tong-Pai Huang

Yu-Wei Lo

Jhong-Lin Li

Pei-Yu Zhu

Chiun-Yu Kuo

A system and method for management of heterogeneous bare metal servers is disclosed. The system includes target bare metal servers coupled to a network and an administrative server. The administrative server executes a framework for managing the bare metal servers. The framework includes unified APIs for performance of management functions. A recognition engine receives identification information from the server and selects a driver from a driver library based on the identification information. Each of the drivers in the driver library is associated with a different type of bare metal server. A driver loader loads the selected driver to translate the unified APIs to native APIs on the bare metal server to perform the management function on the server.

Method and system for consistent API application to heterogeneous bare metal servers

A mask inspection system employs TDI imaging. The mask inspection system is calibrated by iteratively repeating, until a stopping criterion is met: (i) simultaneously acquiring first and second TDI images using respective first and second TDI image sensors of the mask inspection system, the first and second TDI image sensors being configured to acquire the respective first and second TDI images with light of mutually orthogonal polarizations, and (ii) automatically adjusting a position of the second TDI image sensor using an electronic controller that receives a feedback error signal indicative of the shift of the second TDI image respective to the first TDI image along the shift direction. The adjusting may utilize an electronic controller that controls the motor based on a received feedback error signal indicative of the shift of the second TDI image respective to the first TDI image along the shift direction.

Automatic time delay and integration (TDI) mask inspection system calibration

A reticle carrier described herein is configured to quickly discharge the residual charge on a reticle so as to reduce, minimize, and/or prevent particles in the reticle carrier from being attracted to and/or transferred to the reticle. In particular, the reticle carrier may be configured to provide reduced capacitance between an inner baseplate of the reticle carrier and the reticle. The reduction in capacitance may reduce the resistance-capacitance (RC) time constant for discharging the residual charge on the reticle, which may increase the discharge speed for discharging the residual charge through support pins of the reticle carrier. The increase in discharge speed may reduce the likelihood that an electrostatic force in the reticle carrier may attract particles in the reticle carrier to the reticle. This may reduce pattern defects transferred to substrates that are patterned using the reticle, may increase semiconductor device manufacturing quality and yield, and may reduce scrap and rework of semiconductor devices and/or wafers.

Reticle carrier and associated methods

An EUV photolithography system utilizes a baseplate of an EUV pod to unload an EUV reticle from a chuck within an EUV scanner. The baseplate includes a top surface and support pins extending from the top surface. The when the reticle is unloaded onto the baseplate, the support pins hold the reticle at relatively large distance from the top surface of the baseplate. The support pins have a relatively low resistance. The large distance and low resistance help ensure that particles do not travel from the baseplate to the reticle during unloading.

System and method of discharging an EUV mask

An extreme ultraviolet radiation source apparatus includes a chamber including at least a droplet generator, a nozzle of the droplet generator, and a dry ice blasting assembly. The droplet generator includes a reservoir for a molten metal, and the nozzle has a first end connected to the reservoir and a second opposing end where molten metal droplets emerge from the nozzle. The dry ice blasting assembly includes a blasting nozzle, a blasting air inlet and a blaster carbon dioxide (CO) inlet. The blasting nozzle is disposed inside the chamber. The blasting nozzle is arranged to direct a pressurized air stream and dry ice particles at the nozzle of the droplet generator.

Droplet generator and method of servicing extreme ultraviolet radiation source apparatus

An extreme ultraviolet (EUV) lithography method includes causing a first metallic droplet to move along a shroud and through an aperture of the shroud at a first velocity, and adjusting an open area of the aperture of the shroud. After adjusting the open area of the aperture of the shroud, a second metallic droplet is caused to move along the shroud and through the aperture of the shroud at a second velocity, in which the second velocity is different from the first velocity.

Extreme ultraviolet photolithography method

A droplet generator assembly includes a storage tank, a refill system, a droplet generator, and a temperature control system. The storage tank is configured to store a target material. The refill system is connected to the storage tank. The droplet generator includes a reservoir and a nozzle connected to the reservoir, in which the droplet generator is connected to the refill system, and the refill system is configured to deliver the target material to the reservoir. The temperature control system is adjacent to the refill system or the reservoir.

Droplet generator assembly and method for using the same and radiation source apparatus

A method of operating an extreme ultraviolet (EUV) lithography system includes directing a metallic droplet along a shroud, wherein the shroud has a first opening adjacent a droplet generator and a second opening adjacent an excitation region; partially shielding the second opening of the shroud; and emitting a laser beam encountering the metallic droplet to generate an EUV light.

Extreme ultraviolet photolithography system and method

An apparatus coupled to a chamber for processing extreme ultraviolet radiation includes a gas inlet configured to direct exhaust gases from the chamber into a combustion zone. The combustion zone is configured to flamelessly ignite the exhaust gases. An air inlet is configured to direct a mixture of air and a fuel into the combustion zone. A control valve is configured to change a volume of fluid exhausted from the combustion zone. A controller configured to control the control valve so as to prevent a pressure inside the combustion zone from exceeding a preset pressure value is provided.

Method and apparatus for controlling exhaust pressure for an extreme ultraviolet generation chamber

A multimedia output device and an audio output method thereof are provided. The multimedia output device is electrically connected to an external speaker. The audio output method includes following steps. The multimedia output device determines whether an identification resistor exists in the external speaker. If the identification resistor exists in the external speaker, the multimedia output device determines whether the identification resistor complies with a predetermined resistance range. If the identification resistor complies with the predetermined resistance range, the multimedia output device outputs an audio signal to the external speaker to be played.

Growing community of inventors

Taipei, Taiwan

Yen-Hsun Chen