Globalfoundries Singapore Pte. Ltd.

Yemin Dong

Purakh Raj Verma

Liang Yi

Ramadas Nambatyathu

Zhanfeng Liu

Shao-fu Sanford Chu

Chao Cheng

Xin Zou

A method of forming a device is disclosed. A substrate defined with a device region is provided. A gate having a gate electrode, first and second gate dielectric layers is formed in a trench. The trench has an upper trench portion and a lower trench portion. A field plate is formed in the trench. First and second diffusion regions are formed. The gate is displaced from the second diffusion region.

High voltage trench transistor

A method of forming a device is disclosed. A substrate defined with a device region is provided. A gate having an upper and a lower portion is formed in a trench in the substrate in the device region. The upper portion forms a gate electrode and the lower portion forms a gate field plate. First and second surface doped regions are formed adjacent to the gate. The gate field plate introduces vertical reduced surface (RESURF) effect in a drift region of the device.

Integration of high voltage trench transistor with low voltage CMOS transistor

A method of manufacture of an integrated circuit system includes: providing a semiconductor substrate having an active region, implanted with impurities of a first type at a first concentration; forming an isolation region around the active region; forming a parasitic transistor by applying a gate electrode, implanted with impurities of a second type at a second concentration, over the active region and the isolation region; and applying an isolation edge implant, with the impurities of the first type at a third concentration greater than or equal to the second concentration, for suppressing the parasitic transistor.

Integrated circuit system with high voltage transistor and method of manufacture thereof

Growing community of inventors

Singapore, Singapore

Yemin Dong