Kla Tencor Corporation

Oramir Semiconductor Equipment Ltd.

Yehuda Elisha

Yoram Uziel

Joel L Seligson

David Yogev

Michael Faeyrman

Natalie Levinsohn

Yoram Hanfling

Shimon Kostianovsky

Jonathan Baron

Isaac Katz

Lev Fris Man

Yitzhak Ofer

Particles are removed from the surface of a substrate. Respective position coordinates of the particles on the surface are determined. A beam of electromagnetic energy is directed at the coordinates of each of the particles in turn, such that absorption of the electromagnetic energy at the surface causes the particles to be dislodged from the surface substantially without damage to the surface itself.

Method and apparatus for local vectorial particle cleaning

A method and apparatus for automatically focusing a high resolution microscope, wherein during setup the operator designates areas within each field of view where a measurement will be taken, and for each area of interest translates the microscope along its optical axis (Z-axis) while measuring the image intensities at discrete subareas within the area of interest. These image intensities are then evaluated, and those having the greatest signal-to-noise ratio and occurring at a common point along the Z-axis will be selected, and the corresponding subareas identified. During subsequent inspections of the area of interest, only light reflected from the identified subareas will be used to focus the microscope. The invention has application in both conventional microscopy and interferometry.

Autofocusing apparatus and method for high resolution microscope system

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Kfar Vradim, Israel

Yehuda Elisha