Industrial Technology Research Institute

Yeh-Tseng Li

Chen-Kuei Chung

Jin-Shown Shie

Method for the preparation of diffractive lens with one single etching step and using one single etching mask. While the widths and intervals of the masked areas of the photo masks are decided under a geometric relation, an etching mask can be prepared on the substrate of the lens where the widths and the intervals of the masked areas can be determined. As the included angle between the etching mask and the plan of the material of the lens is in a certain ratio to the etching efficiency of the etchant to the substrate of the lens, a one step etching process can be developed whereby multilevel diffractive lens with required number, widths and heights of the levels can be obtained. This invention also provides an oxidation-isotropic etching process on the diffractive lens so prepared.

Growing community of inventors

Hsinchu, Taiwan

Yeh-Tseng Li