Taiwan Semiconductor Manufacturing Comp. Ltd.

Yeh-Chien Lin

Yan-Hong Liu

Jin-Huai Chang

A method of fabricating a semiconductor device is provided. The method includes forming a first metal layer over a semiconductor substrate, and forming a first layer over the first metal layer. The first layer and first metal layer are etched to expose a sidewall of the first layer and a sidewall of the first metal layer, wherein the etching disburses a portion of the first metal layer to create an accumulation of material on at least one of the sidewall of the first layer or the sidewall of the first metal layer. At least some of the accumulation is etched away using an etchant comprising fluorine.

Growing community of inventors

Hsin-Chu, Taiwan

Yeh-Chien Lin