Applied Materials, Inc.

Yee Sheen Pong

Jamie Leighton

Systems and methods are provided for controlling a polishing process in real-time. First and second characteristics are identified in first and second data sets, respectively, with each data set corresponding to a real-time wafer polishing data. A time delta is computed between the times at which the first and second characteristics occur within their respective data sets, and polishing parameters are then updated in real-time based on the computed time delta.

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Union City, CA, United States of America

Yee Sheen Pong