Hitachi, Ltd.

Yataro Kondo

Sumio Hosaka

Yoshio Kawamura

Toshiei Kurosaki

Shinji Kuniyoshi

Tatsuo Harada

Akihiro Takanashi

Masamoto Akeyama

There is disclosed a pattern forming apparatus for projecting a pattern which is formed on a reticle upon a photoresist layer on a substrate which comprises an illumination system for illuminating the pattern for forming an optical image, a reduction lenses for reducing the optical pattern image at a certain reduction ratio and projecting the reduced optical pattern image upon the photoresist layer formed on the substrate for exposing the photoresist layer, and liquid sustaining means for filling a gap between at least a portion of the reduction lenses and the photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one).

Pattern forming apparatus

Growing community of inventors

Koganei, Japan

Yataro Kondo