Sumitomo Chemical Company, Limited

Asahi Glass Company, Limited

Agc Inc.

Optical Coatings Japan

Yasuyuki Takimoto

Toshio Suzuki

Takeshi Kawasato

Kentaro Tsunozaki

Haisheng Zeng

Tegi Ri

Manabu Suhara

Akio Koike

Shinya Kikugawa

Yasutomi Iwahashi

Atsushi Koyanagi

Takamichi Ishikawa

Shunya Taki

Naoko Okada

Takahiro Mashimo

Hideaki Takahoshi

Naoto Tatsuoka

Haruhiko Yoshino

Masaaki Miyake

Yosuke Sugihara

An optical filter includes a substrate and a dielectric multilayer film laid as an outermost layer on at least one major surface of the substrate. The dielectric multilayer film includes a low-refractive index film and a high-refractive index film provided alternately. At least one film selected from the group consisting of the low-refractive index film and the high-refractive index film satisfies the following optical characteristics (i-1) and (i-2A): (i-1) an extinction coefficient kat a wavelength of 600 nm is 0.12 or larger; and (i-2A) a minimum extinction coefficient kin a wavelength range of 1530 to 1570 nm is 0.01 or smaller; and the optical filter satisfies the following optical characteristic (ii-1A): (ii-1A) light in a wavelength range of 400 to 680 nm is blocked and light in the wavelength range of 1530 to 1570 nm is transmitted.

Optical filter

A laminated body includes a transparent substrate having a laminated film. The laminated film includes a dielectric layer containing silicon nitride, a barrier layer composed of a single film or two or more films, and a metal layer containing silver. The barrier layer has a thickness of from 0.1 nm to 10 nm. Each film of the barrier layer includes a material having a crystal structure of a face-centered cubic structure with a lattice constant of from 3.5 to 4.2, a hexagonal close-packed structure with a lattice constant of from 2.6 to 3.3, a body-centered cubic structure with a lattice constant of from 2.9 to 3.2, or a tetragonal crystal with a lattice constant of from 2.9 to 4.4. The metal layer has a thickness of from 7 nm to 25 nm. An orientation index P of the metal layer falls within a range from 4.5 to 20.

Laminated body and method of manufacturing laminated body

To provide a cathode active material for a lithium ion secondary battery excellent in the cycle characteristics and rate characteristics even when charging is conducted at a high voltage. A cathode active material for a lithium ion secondary battery, which comprises particles (III) having a covering layer comprising a metal oxide (I) containing at least one metal element selected from the group consisting of elements in Groups 3 and 13 of the periodic table and lanthanoid elements, and a compound (II) containing Li and P, on the surface of a lithium-containing composite oxide comprising lithium and a transition metal element, wherein the atomic ratio of said P to said metal element (P/metal element) contained within 5 nm of the surface layer of the particles (III) is from 0.03 to 0.45.

Cathode active material for lithium ion secondary battery, and process for its production

To provide a cathode active material for a lithium ion secondary battery excellent in the cycle characteristics and rate characteristics even when charging is conducted at a high voltage. A cathode active material for a lithium ion secondary battery, which comprises particles (III) having a covering layer comprising a metal oxide (I) containing at least one metal element selected from the group consisting of Al, Y, Ga, In, La, Pr, Nd, Gd, Dy, Er and Yb, and a compound (II) containing Li and at least one non-metal element selected from the group consisting of S and B, on the surface of a lithium-containing composite oxide, wherein the atomic ratio (the non-metal element/the metal element) contained within 5 nm of the surface layer of the particles (III) is within a specific range.

Cathode active material for lithium ion secondary battery

It is to provide a silica glass containing TiO, having a wide temperature range wherein the coefficient of thermal expansion is substantially zero. A silica glass containing TiO, which has a TiOconcentration of from 3 to 10 mass %, a OH group concentration of at most 600 mass ppm and a Ticoncentration of at most 70 mass ppm, characterized by having a fictive temperature of at most 1,200&#xb0; C., a coefficient of thermal expansion from 0 to 100&#xb0; C. of 0&#xb1;150 ppb/&#xb0; C., and an internal transmittance Tper 1 mm thickness in a wavelength range of from 400 to 700 nm of at least 80%. A process for producing a silica glass containing TiO, which comprises porous glass body formation step, F-doping step, oxygen treatment step, densification step and vitrification step.

[object Object]

Electric double layer capacitor and electrode therefor

A method for removing a thin film, which comprises applying a powder or solution of a salt to a thin film formed on a substrate, followed by heating to remove the thin film at the applied portion, wherein as the salt, a salt having some or all of hydrogen ions of an acid substituted by ammonium ions or alkali metal ions, is used.

Method for removing a thin film for a window glass

Growing community of inventors

Tokyo, Japan

Yasuyuki Takimoto