Tohoku University

Other

Fujikin Inc.

Nippon Valqua Industries, Ltd.

Canon Kabushiki Kaisha

Mitsubishi Chemical Corporation

Foundation for Advancement of International Science

Nomura Micro Science Co., Ltd.

Panasonic Corporation

Tokyo Electron Limited

Kuraray Co., Ltd.

Sharp Corporation

Nichias Corporation

Hitachi Plant Engineering Construction Co., Ltd.

Tadahiro Ohmi

Yasuyuki Shirai

Takahisa Nitta

Osamu Nakamura

Masaki Hirayama

Nobukazu Ikeda

Akihiro Morimoto

Masafumi Kitano

Yasuhiro Kawase

Kazuhide Ino

Hitoshi Morinaga

Fumikazu Mizutani

Makoto Ishikawa

Shigetoshi Sugawa

Nobuyoshi Tanaka

Koji Sato

Sadao Kobayashi

Tsutomu Yoshida

Eiji Ideta

Yoshihide Wakayama

Naoto Sano

Hiroshi Osawa

Masayuki Noguchi

Toshikuni Shinohara

Akira Muramatsu

Takayuki Jizaimaru

Kiwamu Takehisa

Takeshi Sakai

Tetsutaro Ogushi

Takehisa Konishi

Hideo Hanaoka

Satoshi Kumaki

Kouji Nishino

Michio Yamaji

Tsutomu Shinohara

Ryousuke Dohi

Kazuo Saito

Masaaki Nagase

Yuichiro Yamada

Tokihiko Shinomiya

Toshiaki Sato

Naoki Mori

Hirokazu Suzuki

Yukio Minami

Keiji Hirao

Takaaki Matsuoka

Tetsuya Goto

Atsushi Hidaka

Kazutaka Uekado

Yoshio Yamazaki

Mitsuo Matsumoto

Takeshi Honma

Hitoshi Inaba

Koji Kawada

Satoru Yamashita

Isao Terada

Takashi Ishizumi

Yasushi Aburatani

Ikuo Onishi

Shigemi Murakawa

Tokuo Ikari

Masamichi Iwaki

Yoshinori Ohkubo

Etsuo Nakazato

Hiromu Itoh

Kohei Watanuki

Kengo Iwahara

Takumi Fujita

Takashi Taniguchi

Toshihisa Okabe

Kikuji Kobayashi

Yoshinori Uchino

Taiji Hashimoto

Jiro Yamanaka

Kouji Fukae

Yuki Kuwamura

Kouji Sato

Yuhsaku Ajichi

Yukio Kishi

Provided are: a method of producing heated ozone water, the method capable of producing heated ozone water having an extremely high ozone concentration by suppressing a reduction in the ozone concentration in high-concentration heated ozone water; heated ozone water; and a semiconductor wafer-cleaning liquid using the heated ozone water. A method of producing heated ozone water obtained by dissolving ozone in pure water, the method being characterized by including: adjusting a pH of the pure water to 3 or less by adding acid to the pure water; to obtain an acid water, dissolving an ozone gas in the acid water; and heating the pure water, the acid water or the ozone water, to 60&#xb0; C. or more.

Method of producing heated ozone water, heated ozone water, and semiconductor wafer-cleaning liquid

Conventional ozone water is still insufficient in the removal rate and cleaning ability of resist required in today's semiconductor manufacturing field, and it does not fully meet the expectation of further improvement in the effects of sterilization, deodorization, and cleaning in the fields such as cleaning of foodstuffs, cleaning of process equipment and tools, and cleaning of fingers, as well as in the fields such as deodorization, sterilization, and preservation of freshness of foodstuffs. The above problem can be solved by defining the values of a plurality of specific production parameters in the production of ozone water into specific ranges.

Method for producing ozone water

A metal oxide film suitable for protection of metals, composed mainly of aluminum. A metal oxide film includes a film of an oxide of a metal composed mainly of aluminum, having a thickness of 10 nm or greater, and exhibiting a moisture release rate from the film of 1E18 mol./cmor less. Further, there is provided a process for producing a metal oxide film, wherein a metal composed mainly of aluminum is subjected to anodic oxidation in a chemical solution of 4 to 10 pH value so as to obtain a metal oxide film.

Metal oxide film, laminate, metal member and process for producing the same

An annular metal gasket for sealing a space between members by being pressed in the vertical direction in a state of being mounted between the members, the metal gasket comprising an annular outer ring having a substantially C-shaped cross-section and having a circumferential-direction opening formed therein, and an annular inner ring fitted inside the outer ring. The inner ring is formed so as to have a polygonal cross-section. Bend parts having an Inner angle larger than 180&#xb0; are formed between the upper corner part and the inner- and outer-circumference-side corner parts; and between the lower corner part and the inner- and outer-circumference-side corner parts.

Metal gasket

A vaporizer, capable of stabilizing the behavior of pressure inside the vaporizer, includes a chamber having an inlet and an outlet, a heating device that heats the inside of the chamber, a partition wall structurethat is provided inside the vaporizer and partitions the liquid material inside the chamber into a plurality of sections, and liquid distribution portionsthat are provided at the lower portion of the partition wall structureand that allow liquid distribution among the sections partitioned by the partition wall structure, and the partition wall structure includes a grid-like, honeycomb-shaped, mesh-like, or pipe-shaped partition wall.

Vaporizer

A conventional microwave plasma processing apparatus, even when krypton (Kr) is used as a plasma-generation gas, can only obtain an oxide film or a nitride film having the same level of characteristics as those obtained when a rare gas such as argon (Ar) is used as a plasma-generation gas. Accordingly, instead of forming a dielectric window of a microwave plasma processing apparatus with only a ceramic member, a planarization film capable of obtaining a stoichiometric SiOcomposition by thermal treatment is coated on one of a plurality of surfaces of the ceramic member, the surface facing a process space, and then thermally-treated, thereby forming a planarization insulation film having a very flat and dense surface. A corrosion-resistant film is formed on the planarization insulation film.

Microwave plasma processing apparatus, dielectric window for use in the microwave plasma processing apparatus, and method for manufacturing the dielectric window

A resin molding device which molds a resin tubefrom a molten resin has a tube molding portionand a spindleas jigs which define inner and outer diameters of the resin tube.

Resin molding device

A metal gasket includes an outer ring that is formed in a substantially C-shaped cross-section having an opening in a circumferential direction and an inner ring that is disposed inside the outer ring, wherein the inner ring is configured in a polygonal shape of a cross section, and a pair of corner portions opposing to each other in the inner ring are disposed on inner circumferential faces on the both sides of the opening in the outer ring.

A fixing structure for a welding electrode and a welding head is shown which enable improvement of durability of a welding electrode, improvement of work efficiency in welding, and a reduction of time required for welding and also which make it possible to execute welding for an extended time with high reliability. In the fixing structure, a fixed section of a welding electrode is inserted via a thermally conductive material into an inserting section of a fixing base and a peripheral surface of the fixed section of the welding electrode is uniformly contacted to the fixing base to affix the welding electrode to the fixing base.

Long life welding electrode and its fixing structure, welding head, and welding method

A heating device includes a heat resisting vacuum insulator () wound around the outer periphery of an electric heater () disposed along the outer wall of an exhaust pipe (), wherein the electric heater () has a resistance heating element and a heat resisting electric insulator covering this resistance heating element, and the heat resisting vacuum insulator () includes a hollow platy covering material air-tightly sealed thereinside by a metal seat () having a heat resisting temperature of at least 100&#xb0; C., and a fibrous or granular filling material () filled in the hollow portion of this covering material and having a heat resisting temperature of at least 100&#xb0; C., the inside of the covering material being kept in a vacuum state.

Heat resisting vacuum insulating material and heating device

In a fluorescent lamp, a fluorescent material has a particle size of not greater than 1 &#x3bc;m and a thickness of not greater than 5 &#x3bc;m. With this structure, ultraviolet ray of 254 nm is efficiently converted into visible light and the light obtained by conversion is efficiently emitted to the outside.

Fluorescent lamp

Method for producing at low cost bellows which show high durability even when used in a quite reactive atmosphere. The method for manufacturing bellows includes the steps of: I: forming an untreated bellows from a flat base plate, the base plate including 15 to 30 wt % of Cr, 5 to 40 wt % of Ni, 0.9 to 6 wt % of Al, less than 1 wt % of Mo, less than 0.1 wt % of Mn, less than 0.1 wt % of C, less than 0.1 wt % of S, less than 0.1 wt % of P and a balance of Fe and an unavoidable impurity (relative to 100 wt % of the base plate); and II: heating the untreated bellows at a temperature of 750 to 895&#xb0; C. in an atmosphere which contains water and hydrogen and in which the volume ratio of hydrogen to water (H/HO) is in the range of 2&#xd7;10to 1&#xd7;10, thereby forming an AlOpassivation film on a surface of the untreated bellows.

Method of manufacturing bellows

A low-compression force metal gasket includes a coating layer containing a polymer material on at least a sealing surface of the gasket, and the coating layer satisfies the following conditions (1) to (3): (1) the layer comprises a resin, a rubber or a mixture thereof having an oxygen gas permeability coefficient at 25&#xb0; C. of 10&#xd7;10to 0.1&#xd7;10(m/s); (2) when the layer is compression deformed, the storage elastic modulus (E') at 200&#xb0; C. is in the range of 1.0&#xd7;10to 1.0&#xd7;10Pa; and (3) the coating layer has a thickness of 1 to 40 &#x3bc;m. The gasket provides a high seal at a low clamping force.

Low-compression force metal gaskets

The object of the present invention is to form a chromium-oxide film, excellent in corrosion resistance, without containing an oxide film of other metal onto the metallic material. The chromium-oxide passivation film, excellent in corrosion resistance, without containing the oxide film of other metal can be formed inexpensively and in a short time, and a fluid supplying system for safely supplying fluid with hard corrosivity is able to be provided. One step of forming the passivation film consisting of a chromium oxide layer by giving heat treatment, in an oxidizing atmosphere, after coating chromium on the metallic material having a surface roughness (Ra) not more than 1.5 &#x3bc;m.

Metal material having formed thereon chromium oxide passive film and method for producing the same, and parts contacting with fluid and system for supplying fluid and exhausting gas

Growing community of inventors

Miyagi, Japan

Yasuyuki Shirai