Sumitomo Chemical Company, Limited

Yasuyoshi Sawaguri

Shujiro Shiga

Masaaki Ohkawa

Koji Kabasawa

Akira Morisaki

Yoji Matsuda

Tatsuya Momobayashi

Impurities are removed from aqueous hydrogen peroxide by treating the aqueous hydrogen peroxide by reverse osmosis, cation-exchanging the aqueous hydrogen peroxide and anion-exchanging the aqueous hydrogen peroxide, and the treated ultra-pure hydrogen peroxide can be used in the electronics industries.

Apparatus and method for removing impurities from aqueous hydrogen

A process for purifying a hydrogen peroxide solution is disclosed, comprising treating a 10 to 60% by weight hydrogen peroxide solution having a pH between 1.5 and 5.0 and containing anionic impurities with a hydrogencarbonate type or carbonate type anion exchange resin while adding an acid or a salt thereof having an acid dissociation constant pKa in water of not more than 5 to the hydrogen peroxide solution to be treated continuously or semi-continuously in an amount of from 0.5 to 5 milli-equivalents per liter of hydrogen peroxide solution. The hydrogen peroxide decomposing activity of the anion exchange resin can be inhibited without decreasing a rate of removal of strong acid radicals in the anionic impurities thereby minimizing oxygen evolution due to decomposition of hydrogen peroxide.

Purification of hydrogen peroxide solution

Organic waste water containing water-soluble organic anionic substances is treated by

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Chiba, Japan

Yasuyoshi Sawaguri