Kabushiki Kaisha Toyota Chuo Kenkyusho

Toyoshi Shimada

Yasutomo Goto

Shinji Inagaki

Norihiro Mizoshita

Yuri Sasaki

Masakazu Murase

Yoshiaki Fukushima

Osami Kamigaito

Hiroaki Hayashi

Hiroaki Wakayama

Narihito Tatsuda

Kenichirou Suzuki

Yoshitsugu Kojima

Norihiko Setoyama

Kazuo Higuchi

Megumi Sasaki

The present invention provides a sample plate for laser desorption/ionization mass spectrometry, comprising: a hydrophilic thin film capable of absorbing a laser ray; and a water-repellent thin film comprising surface-hydrophobized nanoparticles and being stacked in a region other than a region to be a sample spot on a surface of the hydrophilic thin film, wherein a water contact angle of the water-repellent thin film is 120&#xb0; or more.

Sample plate for laser desorption/ionization mass spectrometry

An organic silica thin film including: organic silica having a light absorbable organic group in a skeleton, wherein the organic group has a local maximum absorption wavelength in a wavelength range of 200 to 1200 nm, a content ratio of silicon and the organic group which constitute the organic silica is in a range of 0.05 to 0.50 based on a ratio of a mass of the silicon to a mass of the organic group ([mass of the silicon]/[mass of the organic group]), the thin film has a textured structure, and an axis direction of the textured structure is a direction substantially perpendicular to a surface opposite to a surface of the organic silica thin film having the textured structure formed therein.

Organic silica thin film, method for producing the same, laser desorption/ionization mass spectrometric substrate using the same, and laser desorption/ionization mass spectrometric method

Provided is an organosilane compound expressed by any one of the following general formulae (1) to (7): (wherein: Ar represents a phenylene group or the like; Rrepresents a hydrogen atom or the like; Rto Reach represent a methyl group or the like; n represents an integer in a range from 0 to 2; m represents an integer of 1 or 2; L represents a single bond or the like; X represents a hydrogen atom or the like; and Y represents a hydrogen atom or the like).

Organosilane compound and organosilica obtained therefrom

Provided is an organosilane compound expressed by the following general formula (1): where: Ar represents a divalent aromatic organic group, such as a phenylene group; Rrepresents a hydrogen atom or the like; Rto R, which may be the same or different from each other, each represent a hydrogen atom or the like; and X represents a reactive substituent, such as a halogen atom.

Organosilane compound and organosilica obtain therefrom

A coated material comprising a substrate which has micropores and a reaction product coated thereon along the surface configuration of the substrate and an inner wall of the micropores thereof. The coated material is preferably produced by performing a supercritical coating step wherein a reaction precursor is dissolved in a supercritical fluid to form a precursor fluid and then the precursor fluid is brought into contact with a substrate in the presence with a reaction initiator to allow a reaction between the reaction precursor and the reaction initiator, thereby coating a reaction product onto the substrate.

Coated object and process for producing the same

Growing community of inventors

Owariasahi, Japan

Yasutomo Goto