Kabushiki Kaisha Toshiba

Renesas Technology Corp.

Yasutaka Kikuchi

Atsushi Yamazaki

Taro Fukaya

Kenji Tsutsumi

Shuji Seki

Ichiro Yamanashi

Hirofumi Noguchi

Yoshikazu Nagamura

Kunihiro Hosono

Koji Tange

Koichi Kido

Yuki Oomasa

According to one embodiment, a copper recovery apparatus includes a precipitation tank, a mixing tank, a filter-aid feeder, a solid-liquid separator includes a filter, a cleaning-water supply line, a cleaning-water discharge line, a separation tank, and a filter-aid return line. The precipitation tank is configured to receive copper ions-containing water to be treated and an alkali to prepare treated water containing a precipitate of copper compound. The solid-liquid separator is configured to allow the treated water to be passed through the filter on which the precoat layer is deposited to separate the precipitate retained on the precoat layer from a filtrate.

Copper recovery apparatus

According to one embodiment, a copper recovery apparatus includes a precipitation tank configured to precipitate copper hydroxide grains in water, a filter aid supplier, a mixing tank configured to mix the filter aid with a water to produce a suspension, a separator provided with a filter, a line configured to supply the suspension to the separator, thereby forming a precoat layer formed of the filter aid on the filter, a separation tank configured to receive the detached matter of the precoat layer discharged together with the detaching water from the separator to magnetically separate copper hydroxide grains and filter aid, a line configure to discharge and recover the detaching water from the separation tank, and a line configured to return the separated filter aid to the filter aid supplier from the separation tank.

Copper recovery apparatus and copper recovery method

A photomask provided with a light-shielding coating on a surface of a glass substrate is cleaned with Ogas solved water to eliminate organic substances adhered on a surface of the photomask (S). Using an alkaline chemical such as alkaline ionized water or hydrogenated water, the photomask is then cleaned to eliminate contamination (S). After completion of these cleaning steps, the photomask is dried (S).

Cleaning process for photomasks

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Tokyo, Japan

Yasutaka Kikuchi