Hitachi, Ltd.

Hitachi Construction Machinery Co., Ltd.

Yasushi Nakaizumi

Eiichi Hazaki

Osamu Yamada

Akimitsu Okura

Mitsugu Sato

Sumio Hosaka

Katsuhiro Kuroda

Shigeyuki Hosoki

Masahide Okumura

Akira Hashimoto

Toshiaki Kobari

Osamu Satou

Tadashi Ohtaka

Yukichi Ueno

Yasuhiko Ishida

Minoru Hiroki

Hideiti Kimura

A vacuum container is evacuated to be kept at an ultra-high vacuum. Valve means is provided for connecting and disconnecting the inside of the vacuum container with and from the outside thereof, and includes a vacuum-tight seal made of a high polymer having a water absorptivity of 0.1% and less and an outgassing rate of 2.times.10.sup.-6 (Torr.multidot.l/sec/cm.sup.2 :at 200.degree. C.) and less.

Ultra-high vacuum apparatus

A specimen is scanned with an electron beam so as to generate a signal characteristic of the specimen to thereby produce an image thereof on the basis of the generated signal. A memory is provided for storing operating conditions of a scanning electron microscope which are associated with identification information for specifying the specimen. The identification information is designated so that thereby at least one operating condition corresponding to the designated identification information is read out from the memory, and the read out operating condition is automatically set so that the scanning electron microscope is operated under the set operating condition.

Charged particle beam apparatus and it's operating method

A scanning tunnel microscope comprising: a SEM stage provided in a specimen chamber of a SEM and having a mechanism for moving in a two dimensional manner along a surface perpendicular to an electron beam; a specimen stage provided on the SEM stage and provided with a mechanism for holding a specimen so that a surface of the specimen makes an angle of 45.degree. with the electron beam and for moving the specimen in a two dimensional manner in directions of the specimen surface; an STM scanning mechanism provided on the SEM stage and provided with a probe held perpendicularly to the specimen surface, a coarse movement mechanism for making the probe approach to a position at a desired distance from the specimen surface, and a probe fine movement mechanism for making the probe scan along the specimen surface; and a display unit for displaying an image by the SEM together with an image of the probe on the basis of signal obtained from a secondary electron detector provided in a specimen chamber and for displaying an image by the STM on the basis of signals from the probe fine movement mechanism.

Scanning tunnel microscope equipped with scanning electron microscope

A sample is mounted on a support table adjacent a probe of a scanning tunnelling microscope, the support table permitting the sample to move relative to the probe. The probe is also movable in a direction generally perpendicular to the sample surface, between a withdrawn position and a scanning separation. A scanning electron microscope is located adjacent the sample and probe, and its electron beam scans both the sample and the probe and generates an image on a display from electrons from the sample detected by a detector. In order that that operator can position the probe on a target of a sample, for scanning by the probe, a marker is generated on the display by a graphics display unit, which marker indicates the probe-to-sample separation and preferably indicates the probe-to-sample approach point and the direction of movement of the probe towards the sample. The graphics display unit may alternatively, or in addition, generate a marker representing the scan area of the probe when it is moved to a scanning separation from the sample.

Combined scanning electron and scanning tunnelling microscope apparatus

Secondary electron detecting apparatus

An electron producing apparatus of the field emission type wherein instantaneous values of an emitted current are sequentially measured to store a relative minimum value of the emitted current which is obtained in such a manner that one instantaneous value which is stored is then replaced by another instantaneous value which is even smaller in magnitude than the previously stored one, and at the same time the instantaneous values are sequentially compared with the stored relative minimum value so that the electron producing apparatus is deenergized when an instantaneous value assumes a certain magnitude relative to the stored relative minimum value.

Field emission apparatus

Growing community of inventors

Katsuta, Japan

Yasushi Nakaizumi