Mitsubishi Gas Chemical Company, Inc.

Yasushi Miki

Nobuyuki Koike

Toshio Hidaka

Katsumi Higuchi

Shuya Suenaga

The present invention provides a process for producing a transparent heat-resistant gas-barrier film capable of exhibiting a good gas-barrier property and maintaining good properties even after heat-treated at a temperature of 250&#xb0; C. or higher, in a simple manner at low costs without need of a large size facility and a number of steps. The process for producing a transparent heat-resistant gas-barrier film according to the present invention includes the steps of coating a polysilazane-containing solution onto at least one surface of a transparent polyimide film formed of a polyimide containing a specific repeated unit; and calcining the coated solution at a temperature of 180&#xb0; C. or higher to laminate a silicon oxide layer obtained by the calcination on the transparent polyimide film.

Method for manufacturing transparent, heat-resistant gas-barrier film

Methylamines are prepared from methanol and ammonia in the presence of modified molecular sieve catalysts obtained by mixing crystalline molecular sieves such as SAPO with modifiers such as titanium oxide. The catalysts are also suitably used for a disproportionation reaction of monomethylamine.

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Kanagawa, Japan

Yasushi Miki