Agency of Industrial Science and Technology

Jeol Ltd.

Ministry of International Trade & Industry

Fujirebio Inc.

Yasushi Kondo

Takeshi Muranaka

Yutaka Hayashi

Makoto Asakura

Tomohiro Endo

Kazuyuki Oguri

Mine Yamashita

Yasuhiro Fukumoto

Hidenobu Kawada

Kenichi Ishii

Kouichi Saika

Yoshikazu Tagawa

Eita Kinoshita

There is provided an automated analyzer which has plural liquid tanks connected with a dispensing probe and which can efficiently switch the operative liquid tank according to measurement item. The automated analyzer includes a liquid dispenser having a dispensing probe and a pump capable of aspirating and dispensing a liquid from and into an open end of the probe, the liquid dispenser being operative to cause the liquid aspirated in the probe and a probe internal liquid to be dispensed into aliquot receptacles. The automated analyzer also includes; an internal liquid supply device having plural liquid tanks in which probe internal liquids corresponding to measurement items are stored, the supply device being operative to supply a probe internal liquid into the dispensing probe from one of the tanks. The automated analyzer further includes an input section and an operation controller.

Apparatus and method for automated analysis

A measurement device that includes a plurality of lines for conveying a reaction container containing a sample and measures a predetermined material included in the sample while conveying the reaction container by the plurality of lines, wherein the plurality of lines include: a first reaction line for conveying a reaction container at a first convey speed; a second reaction line for conveying a reaction container at a second convey speed; and a measurement line for measuring a predetermined material included in a sample reacted with a reagent within the reaction container in the first reaction line and a sample reacted with a reagent within the reaction container in the second reaction line, the measurement line conveying the reaction containers at a third convey speed that is higher than the first convey speed and the second convey speed.

Measurement device and measurement method

The automatic analyzer repeatedly performs a first processing operation for creating a pretreated specimen with a pretreatment solution in a first reaction cell. The analyzer also repeatedly performs a second processing operation for creating a reacted specimen by reacting the pretreated specimen with a reagent in a second reaction cell. In a first control operation, a turntable is rotated through a first angle in a first direction and halted. In a second control operation, the turntable is rotated through a second angle in a second direction and halted. The second reaction cell is spaced by a second angle in a first direction from the first reaction cell. The turntable is so rotated that the first and second reaction cells are halted at least in first, second, and third positions.

Automated analyzer

In a method for treating the surface of either crystalline or amorphous silicon a silicon material is maintained in a non-oxidizing atmosphere with a reduced pressure, a gas selected from among hydrides of phosphorus, fluorides of phosphorus, hydrides of arsenic, fluorides of arsenic, hydrides of boron, fluorides of boron and fluorides of silicon is excited and the excited gas is supplied onto the surface of the silicon material for a prescribed period of time. During this period the temperature of the silicon material is maintained within a range higher than the temperature at which the molecules of the selected gas would, were the gas not excited, liquefy at the reduced pressure and deposit on the material and lower than the temperature at which the gas decomposes. The method enables the silicon material surface to be cleaned and/or protected by treatment at a relatively low temperature. The treatment has the effect of improving various electrical, chemical and physical characteristics of the surface of silicon material and as such improves the performance and characteristics of a device or integrated circuit including the silicon material.

Method for treating surface of silicon

A method of gas reaction process control in which plasma gas generated in a location different than a location at which a specimen is held is transported to a location at which the specimen is held and gas processing of the specimen is carried out. A control electrode with porous structure permeable to the plasma gas is provided in the transportation route and a voltage is applied to the control electrode voltage for adjusting the specimen surface potential so as to prevent degradation of the specimen due to specimen surface potential.

Method of gas reaction process control

Growing community of inventors

Tokyo, Japan

Yasushi Kondo