Japan Display Inc.

Kabushiki Kaisha Toshiba

Toshiba Matsushita Display Technology Co., Ltd.

Yasushi Kawata

Akio Murayama

Takumi Sano

Arichika Ishida

Kisako Ninomiya

Takeshi Yamaguchi

Kazuyuki Sunohara

Yuuzo Hisatake

Hajime Yamaguchi

Masaki Obi

Natsuko Fujiyama

Yoshiro Aoki

Kazuki Taira

Masato Hiramatsu

Kohki Takatoh

Satoru Yamanaka

Norihiro Yoshida

Masaki Kinoshita

Azusa Ikeda

Kenji Kawamata

Hiroyuki Kurisu

Tatsuya Miyazaki

Hayato Kurasawa

Kenji Nakao

Masaya Tamaki

Hirotaka Hayashi

Rei Hasegawa

Masaaki Tamatani

Yuko Kizu

Yuzo Hisatake

Miki Mori

Yoshihisa Mizutani

Muneharu Akiyoshi

Hiroyuki Nagata

Seizaburo Shimizu

Norihiko Kamiura

Masanori Sakamoto

Yoko Fukunaga

Shinichi Sanada

Eri Sasaki

Chigusa Tago

Hideki Ito

A detection device includes a substrate, a plurality of detection electrodes arranged in a detection area of the substrate, an organic semiconductor layer that covers the detection electrodes, and a counter electrode provided above the organic semiconductor layer. The organic semiconductor layer includes at least either of a first p-type semiconductor layer and a first n-type semiconductor layer, and an active layer. The active layer is provided in each overlapping area overlapping a corresponding one of the detection electrodes, and has a structure in which a p-type semiconductor area and an n-type semiconductor area are mixed and coexist. The first p-type semiconductor layer or the first n-type semiconductor layer is provided in a non-overlapping area not overlapping the detection electrode, and is provided between the adjacent active layers.

Detection device

According to one embodiment, a flexible substrate includes an insulating basement, a plurality of wiring lines, a plurality of electrical elements connected to the plurality of wiring lines, and a metal layer. The insulating basement includes a plurality of line portions supporting the plurality of wiring lines, and a plurality of island-shaped portions supporting the plurality of electrical elements. The plurality of line portions connect the plurality of island-shaped portions. The plurality of wiring lines and the electrical elements are located between the insulating basement and the metal layer.

Flexible substrate

According to an aspect, a detection device includes: a substrate; an anode electrode provided on the substrate; a cathode electrode that is provided on the same layer as that of the anode electrode and is adjacent to the anode electrode; and an organic semiconductor layer that has a structure in which a p-type semiconductor layer and an n-type semiconductor layer coexist and that is provided so as to cover the anode electrode and the cathode electrode.

According to one embodiment, a display device comprises a flexible substrate, a first insulating film disposed on the flexible substrate, a switching element disposed on the first insulating film, a signal wiring electrically connected with the switching element, a first organic film disposed on the signal wiring, a connection wiring disposed on the first organic film, a second organic film disposed on the connection wiring and a pad electrode disposed on the second organic film. The connection wiring is located between the first organic film and the second organic film and is in contact with the first organic film and the second organic film.

Display device

According to one embodiment, a display device includes a first substrate including a first resin substrate having a first thermal expansion coefficient, and a first barrier layer having a second thermal expansion coefficient which is lower than the first thermal expansion coefficient, a second substrate including a second resin substrate having a third thermal expansion coefficient which is equal to the first thermal expansion coefficient, and a second barrier layer having a fourth thermal expansion coefficient which is lower than the third thermal expansion coefficient and is equal to the first thermal expansion coefficient, and a display element located between the first resin substrate and the second resin substrate.

According to an embodiment, a flexible substrate includes a flexible insulating base and a plurality of wirings on the insulating base. Furthermore, the insulating base includes a first opening, a second opening shape of which is different from that of the first opening, and a first line portion. The first line portion is disposed between the first opening and the second opening.

According to one embodiment, a display device includes an insulating substrate including a first main surface, a first supporting substrate adhered to the first main surface of the insulating substrate, and a second supporting substrate spaced from the first supporting substrate and adhered to the first main surface of the insulating substrate, and the first supporting substrate includes a first side surface opposing the second supporting substrate, the second supporting substrate includes a second side surface opposing the first supporting substrate, the first supporting substrate is formed into a tapered shape which narrows toward the first side surface, and the second supporting substrate is formed into a tapered shape which narrows toward the second side surface.

According to one embodiment, a method of manufacturing a display device, includes preparing a first substrate in which a first display element part, a first extension part, a second display element part, and a second extension part, are formed, preparing a second substrate in which a first peeling auxiliary layer, a second peeling auxiliary layer, a sacrifice layer, a first color filter layer, and a second color filter layer, are formed, attaching the first substrate and the second substrate, and radiating a laser beam on the second substrate, and peeling a second support substrate from the first peeling auxiliary layer and the second peeling auxiliary layer while blocking the laser beam by the sacrifice layer.

Method of manufacturing display device

According to one embodiment, a display device includes an underlying insulation layer formed on a surface of a resin layer, and a thin-film transistor formed above the surface of the resin layer via the underlying insulation layer. The underlying insulation layer includes a three-layer multilayer structure of a first silicon oxide film, a silicon nitride film formed above the first silicon oxide film, and a second silicon oxide film formed above the silicon nitride film.

Method of manufacturing display device having a multilayered undercoating layer of silicon oxide and silicon nitride

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Tokyo, Japan

Yasushi Kawata