Tokyo Ohka Kogyo Co., Ltd.

Fujitsu Corporation

Canon Denshi Kabushiki Kaisha

Yasushi Fujii

Atsushi Matsushita

Yoshihiro Inao

Koki Tamura

Atsushi Kubo

Hirofumi Imai

Takahiro Yoshioka

Daisuke Kawana

Yasumasa Iwata

Isao Sato

Tatsuhiko Shibuya

Hisanobu Harada

Hiroshi Ito

Akihiko Nakamura

Koichi Misumi

Dai Shiota

Kazumasa Wakiya

Kazufumi Sato

Kunihiro Noda

Takashi Fujimoto

Hiroki Chisaka

Shigeru Kato

Tomotaka Yamada

Kazuaki Sakuta

Minoru Sashida

Kazuya Someya

Shigeru Yokoi

Toshikazu Takayama

Hiroyuki Iida

Naoki Yamashita

Shingo Ishida

Masashi Yamaguchi

Yasuhiko Hashizume

Isamu Takagi

Hirotsugu Kumazawa

Takuma Hasegawa

Shinji Takase

Tatsuhiro Mitake

Koji Yonemura

Emi Maeno

Hideo Imura

Yoshitomo Oota

A method of producing a cell culture chip, in which a first adhesive is film-formed on a first substrate having transparency such that a first adhesive layer and a recessed portion on which one or more cell culture flow paths are formed face each other, and a second adhesive is film-formed on the first substrate such that a second adhesive layer and a flat portion around the recessed portion face each other, thereby obtaining a cell culture flow path substrate, the first adhesive containing a polyester-based resin having a glass transition temperature of 5&#xb0; C. or higher, and the second adhesive containing a polyester-based resin having a glass transition temperature of lower than 5&#xb0; C.

Method of producing cell culture chip

To provide a silica-based film-forming composition, which can form a homogeneous silica-based film, a method of producing a substrate including a silica-based film using the composition, and an additive agent to be added to a silica-based film-forming composition. In a silica-based film-forming composition including a polysilazane (A) and a solvent (S), a nitrogen-containing polar organic solvent is included as the solvent (S). In addition, the composition including a polysilazane (A) and a nitrogen-containing polar organic solvent as the solvent (S) is coated onto the surface of a substrate to form a coated film, which is then baked to produce a substrate including a silica-based film.

Silica-based film-forming composition, method of producing substrate including silica-based film, and additive added to silica-based film-forming composition

A method for processing a mold material which includes a heating step of heating a mold material layer formed of the mold material to discharge gas from the mold material constituting the mold material layer.

Method for processing mold material and method for manufacturing structural body

A composition capable of stably providing a high-quality siliceous film even under relatively low-temperature heating conditions, and a method of using the composition for forming a siliceous film. The composition includes a polysilazane and an imidazole group-containing compound represented by Formula (B). 

Composition and method of producing siliceous film

A supporting member separation method of separating a laminate formed by laminating a substrate, an adhesive layer, a release layer which is changed in quality by absorbing light, and a support plate in this order, the method including an irradiation step in which irradiation of laser light which is pulse-oscillated with a pulse having a pulse width of 20 ns or greater is performed to the release layer.

Supporting member separation method and supporting member separation apparatus

A method for forming a release layer which lies between a substrate and a supporting member and has a property that changes when the release layer absorbs light coming through the supporting member, by carrying out plasma CVD with a high-frequency power that is set so as to be higher than a power at which a mode jump occurs.

Method of manufacturing multilayer body, method of processing substrate, and multilayer body

A laminate including a supporting member which is light transmissive; a supported substrate which is supported by the supporting member; an adhesive layer which is provided on a surface of the supported substrate on which surface the supported substrate is supported by the supporting member; and a release layer, which (i) is provided between the supporting member and the supported substrate and (ii) contains a polymer including, in a repeating unit, a structure having a light absorption property, a property of the polymer being changed when the polymer absorbs light irradiated via the supporting member.

Laminated body and method for separating laminated body

A laminate including a supporting member which is light transmissive; a supported substrate supported by the supporting member; an adhesive layer provided on a surface of the supported substrate which surface faces toward the supporting member; and a release layer which is made of an inorganic material and is provided between the supporting member and the supported substrate, the release layer having a property that changes when the release layer absorbs light coming through the supporting layer, and the release layer having a flat surface which faces the adhesive layer.

Laminate and method for separating the same

An attachment method including an overlapping step of overlapping a support plate over a substrate under a reduced pressure environment; a temporary fixing step of temporarily fixing the support plate to the substrate; and an attaching step of attaching the support plate to the substrate under a reduced pressure environment. The method further includes, prior to the overlapping step, at least one of a first heating step in which heating is performed under an atmospheric pressure environment and a second heating step in which heating is performed under a reduced pressure environment.

Attachment method

A laminate including a supporter which transmits infrared; a substrate supported by the supporter; an adhesive layer via which the supporter and the substrate are attached to each other; and a separation layer positioned on a surface of the supporter to which surface the substrate is attached, and which is made of a compound having an infrared-absorbing structure. A target is tightly attached and supported in the laminate while securing easy separation of a supporter from the target.

A laminate including a supporting member which is light transmissive; a supported substrate supported by the supporting member; an adhesive layer provided on a surface of the supported substrate which surface faces toward the supporting member; and a release layer which is made of a fluorocarbon and is provided between the supporting member and the supported substrate, the release layer having a property that changes when it absorbs light coming through the supporting member.

Scanner

A stage is provided on which is mounted a substrate that has a concavo-convex portion such as a circuit formed on the underside thereof. A channelthrough which a coolant such as water flows is formed in a stage. An annular flange portionis formed on the top surface of the stage. The inner side of the flange portionforms a concave portion. The top surface of the flange portionis provided with a smooth finish in order to mount a peripheral section of the underside of a substrate W thereon. Holes through which are passed three positioning pinsand lift pinsare provided in the flange portionat regular intervals in the circumferential direction.

Stage for substrate

A photosensitive resin composition which has a quenching function and satisfactory long-term stability and which, in particular, can be prevented from suffering sensitivity abnormality caused by change with time during storage (change from given sensitivity); and a method of forming a pattern from the composition. The resist composition contains a base resin comprising, as the main component, a silicon-containing polymer which is a siloxane or silsesquioxane polymer or the like, the composition containing, as a quencher, a specific sulfonium compound in place of a nitrogenous compound.

Photosensitive resin composition and method of forming pattern

A thermoacid generator for antireflective film formation, characterized by being represented by the following formula (1): (wherein Rrepresents Calkyl, alkenyl, oxoalkyl, or oxoalkenyl (hydrogen atoms in these groups may have been replaced with fluorine atoms); Rrepresents linear, branched, or cyclic Calkyl, alkenyl, oxoalkyl, or oxoalkenyl, Caryl, or Caralkyl or aryloxoalkyl; Rrepresents hydrogen or alkyl; and Yrepresents a non-nucleophilic counter ion); a composition for forming an antireflective film; and an antireflective film made from the composition. With the thermoacid generator and composition, satisfactory etching resistance and the satisfactory ability to prevent the reflection of short-wavelength light (ability to absorb short-wavelength light) are attained. Furthermore, the antireflective film can inhibit an overlying photoresist film from generating a scum.

Thermoacid generator for antireflection film formation, composition for antireflection film formation, and antireflection film made therefrom

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Kawasaki, Japan

Yasushi Fujii