Olympus Corporation

Evident Corporation

Yasuo Yonemaru

Kenichiro Abe

Kengo Osawa

An image processing method includes: generating two images by performing two image enhancement processes for a microscopic image; and generating a corrected image obtained by compositing the two images, wherein the generating the two images includes generating a high-frequency enhanced image in which high-frequency components of the microscopic image are enhanced relative to low-frequency components of the microscopic image that have a lower frequency than the high-frequency components, and generating a microstructure enhanced image in which a microstructure in an observation sample included in the microscopic image is enhanced.

Image processing method for microscopic image, computer readable medium, image processing apparatus, image processing system, and microscope system

A microscope objective includes: a first lens group that has a positive refractive power and includes a first cemented lens; and a second lens group, the first lens group and the second lens group having concave surfaces adjacent to and facing each other. The second lens group includes: at least one lens component that has a negative refractive power overall; a second cemented lens; and a single lens having a positive refractive power. An axial marginal light ray height is maximized at the lens surface of the microscope objective that is the closest to an image. The microscope objective satisfies the following conditional expression:&#x2212;0.38&#x2264;&#x2264;0.38&#x2003;&#x2003;(1)

Microscope objective

A dry microscope objective with a 20-fold magnification or lower that includes a first lens group having a positive refractive power and a second lens group having a positive refractive power, wherein the first and second lens groups have concave surfaces adjacent to each other and facing each other, and the microscope objective satisfies the following conditional expressions:1.4&#x2264;((1)&#x2212;(0))/DOF&#x2264;2.3&#x2003;&#x2003;(1)0&#x2264;()&#x2264;0.1&#x3bb;(0&#x2264;&#x2264;0.7)&#x2003;&#x2003;(2)where Windicates a function of a d-line optimization position that is an longitudinal position at which an RMS wavefront aberration in a d line at the object height ratio is minimized; DOFindicates a depth of focus for the d line; Windicates a function of an RMS wavefront aberration in a C line that occurs at the d-line optimization position; Fiy indicates the object height ratio; and &#x3bb;indicates the wavelength of the d line.

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Tokyo, Japan

Yasuo Yonemaru