Mitsubishi Gas Chemical Company, Inc.

Yasuo Sugihara

Kazushige Tanaka

Toshio Komatsu

Teruo Takeuchi

Hidechika Wakabayashi

Akira Hosomi

Takashi Kashiba

Hidetoshi Hatakeyama

Shizuo Togo

Michiya Kawakami

Takaki Ikebe

Futoshi Nakaya

Shigeki Shimokawa

Hisashi Sakaitani

Ikue Sakuma

An acidic or basic hydrogen peroxide cleaning fluid for cleaning a semiconductor substrate, comprising a phosphonic acid chelating agent and a wetting agent, or comprising a wetting agent alone.

Cleaning fluid for semiconductor substrate

A process for purification of hydrogen peroxide is provided which comprises contacting an aqueous hydrogen peroxide solution with a chelate resin. According to the process, it is possible to remove impurities in the aqueous hydrogen peroxide solution in high efficiency, and particularly, it is possible to remove iron, aluminum, etc., which are difficult to remove singly by ion exchange resins, up to extremely low concentrations. Highly pure hydrogen peroxide solutions obtained by this invention can suitably used for washing of silicon wafers.

Process for purification of hydrogen peroxide

A food-preserving agent comprising an oxygen absorbent and a compound represented by the following structural formula (I): ##STR1## , wherein n is an integer of 2 to 4 and X is H or CH.sub.3, can remove generated acetaldehyde effective, thereby preserving food without any fear of disagreeable odor for a long duration.

Food-preserving agent

Cleaning solution of semiconductor substrate

The present invention relates to novel oxygen absorbent comprising as main ingredients a 1,2-glycol, glycerine or sugar alcohol with the oxygen absorbent materials.

Oxygen absorbent

There are disclosed an oxygen absorbent comprising boron or a reducing boron compound, an alkaline substance and a carrier, an oxygen absorbent parcel formed by enclosing said oxygen absorbent in a permeable packaging parcel, a food package and a package of a metallic or electronic product or part containing said oxygen absorbent parcel.

A method for purifying an impure aqueous hydrogen peroxide solution, which comprises passing an impure aqueous hydrogen peroxide solution through

Method for purifying impure aqueous hydrogen peroxide solution

A method of removing organic impurities from an aqueous solution of hydrogen peroxide, which comprises bringing an aqueous solution of hydrogen peroxide containing organic impurities into contact with a halogen-containing porous resin having a true specific gravity in the wet state of 1.1 to 1.3.

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Tokyo, Japan

Yasuo Sugihara