Dainippon Screen Mfg. Co., Ltd.

Kabushiki Kaisha Kobe Seiko Sho

Tmt Machinery, Inc.

Yasuo Okuyama

Kimitsugu Saito

Yoshihiko Sakashita

Yusuke Muraoka

Katsumi Watanabe

Shogo Sarumaru

Tomomi Iwata

Ikuo Mizobata

Hisanori Oshiba

Eiji Fukatsu

Jun Munemasa

Hiroyuki Ueno

Takashi Gama

After subjected to a developing process, a rinsing process and a replacing process in this order in a developing unitA,B, a substrate W wet with an anti-drying solution is wet-transported to a supercritical drying unitby a primary transport robot. The supercritical drying unitperforms a high-pressure drying process (supercritical drying process) in a dedicated manner. Accordingly, by virtue of the presence of the anti-drying solution, the substrate W is effectively prevented from becoming air-dry during the transportation of the substrate W.

Substrate processing method, substrate processing apparatus and substrate processing system

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Kyoto, Japan

Yasuo Okuyama