Nissin Electric Co., Ltd.

Yasuo Murakami

Hiroshi Murakami

Takahiro Nakahigashi

Kiyoshi Ogata

Takashi Mikami

Jo Takeuchi

Koji Miyake

This invention is directed to a carbon film-coated article comprising a substrate; a mixed layer formed on at least a part of the substrate, and composed of an element(s) constituting the substrate and tungsten; a tungsten film formed on the mixed layer; and a carbon film formed on the tungsten film. The invention provides a method of producing the carbon film-coated article, the method comprising the steps of: forming a mixed layer on at least a part of the substrate, the mixed layer being composed of an element(s) constituting the substrate and tungsten, forming a tungsten film on the mixed layer, and forming a carbon film on the tungsten film, wherein at least one of the mixing layer, the tungsten film and the carbon film is formed using a cathode material evaporated by arc discharge in a vacuum arc deposition apparatus having a vacuum arc evaporation source including the cathode.

Carbon film-coated article and method of producing the same

A vacuum arc vapor deposition apparatus can form a film of good quality without uselessly increasing a time from start of film deposition to completion thereof even when a trigger electrode induces vacuum arc discharge in response to turn-off of the vacuum arc discharge during deposition of the film onto the deposition target object. For example, the vacuum arc vapor deposition apparatus includes a shield member moved to and away from a position between a vapor source and a holder for supporting the deposition target object, a drive device for locating the shield plate selectively in a shield position between the vapor source and the holder, and a retracted position shifted from the shield position, a detector (e.g., current detector) detecting turn-on/off of the vacuum arc discharge, and a control portion controlling the drive device to locate the shield plate in the shield position when the detector detects turn-off of the vacuum arc discharge, and to locate the shield plate in the retracted position when a time required for stabilizing the vacuum arc discharge elapses after the detector detected turn-on of the vacuum arc discharge.

Vacuum arc vapor deposition apparatus

To prevent the film forming characteristic deterioration by a magnetic field of a magnetic filter to thereby make vacuum arc vapor deposition uniform, in the invention, plurality of magnets includes a terminal magnet closest to a plasma injection hole located at the other end of duct and specified magnets. The terminal magnet located closest to plasma injection hole may be set to incline to a plasma injection plane of the plasma injection hole. Further, at lease one of specified magnets may be inclined to the plasma injection plane. Further more, at least one of magnetic field generating coils may be formed with a plurality of electromagnetic coils, which are inclined at different angles with respect to a cross section of the duct. One of electromagnetic coils may be selectively energized by current on a basis of setting and controlling of deflection magnetic field generated by the magnetic filter.

Vacuum arc vapor deposition process and apparatus

A carbon film C containing carbon as a main component, formed on the surface of a soft base material , characterized in that the film C is cracked A and divided into a plurality of regions B, and an average area of respective regions (blocks) surrounded by cracks A is 0.15&times;10 mm to 20&times;10 mm .

Carbon film and method of forming the same

A carbon film containing fluorine and hydrogen, wherein a spectrum determined by FT-IR (Fourier Transform Infrared) spectrum analysis exhibits such a relationship that a ratio (IR.C&mdash;F)/(IR.C&mdash;H) between a peak area (IR.C&mdash;F) in a range from 1000 cm resulting from C&mdash;F bonds and a peak area (IR.C&mdash;H) in a range from 2800 cm to 3100 cm resulting from C&mdash;H bonds is larger than 0, and a spectrum determined by XPS (X-ray photoelectron spectrum analysis) exhibits such a relationship that a ratio (F /C ) between a peak intensity resulting from F and a peak intensity resulting from C is larger than 0 and smaller than 3. A carbon film containing hydrogen and nitrogen. A carbon film containing at least one of metal, metal compound, silicon and silicon compound.

Carbon film method for formation thereof and article covered with carbon film and method for preparation thereof

The invention provides a plasma CVD method and device which can form a uniform or substantially uniform film on an outer surface of an object independently of the shape of the object, and also provides an electrode used in the method and device. More specifically, a plasma is formed from a deposition material gas by supplying an electric power to the gas, and a film is formed on the outer surface of a hollow object having an opening under the plasma. The electrodes for supplying the electric power for forming the gas plasma include an internal electrode arranged in an inner space of the hollow object and an external electrode arranged outside the object. The internal electrode can selectively have a reduced form allowing passage of the electrode through the opening of the hollow object and an enlarged form predetermined in accordance with the volume and shape of the inner space of the object.

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Kyoto, Japan

Yasuo Murakami