Mitsubishi Denki Kabushiki Kaisha

Dan Science Co., Ltd.

Yasuo Kamimura

Takaaki Fukumoto

Toshiaki Ohmori

Masaharu Hama

Motonori Yanagi

A carrier cleaning and drying apparatus for cleaning and drying a wafer processing carrier has a cleaning tank for accommodating the carrier and a high-pressure injection nozzle disposed in an upper portion of the cleaning tank and for injecting a pressurized cleaning solution. This high-pressure injection nozzle is moved within a plane and the cleaning solution is injected at high pressure therefrom, thereby removing dust adhering to the inner and outer surfaces of the carrier by means of the force of injection. A supporting and rotating mechanism portion is also provided which, during cleaning of the carrier, swings the carrier at a predetermined angle, and, after cleaning, effects drying by spinning the carrier at high speed.

Growing community of inventors

Hachioji, Japan

Yasuo Kamimura