Canon Kabushiki Kaisha

Yasuo Hasegawa

Shinichi Hara

Eiji Sakamoto

Yoshinori Miwa

Yoshiki Kino

Kazuhiro Takahashi

Yuichi Yamada

Tadashi Arai

Takashi Sukegawa

Hideki Nogawa

Atsushi Shigenobu

Fumio Sakai

Shinji Utamura

Kazuhito Outsuka

The present invention provides an exposure apparatus including a map obtaining unit configured to obtain a pupil aberration map representing saturation values of fluctuations in each of optical characteristics generated in a plurality of regions, which are obtained by dividing a pupil plane of a projection optical system, upon irradiating the plurality of regions with a unit amount of light, a distribution obtaining unit configured to obtain a light intensity distribution formed on the pupil plane of the projection optical system upon illuminating a pattern of an arbitrary reticle in an arbitrary illumination mode, and a calculation unit configured to calculate a saturation value of a fluctuation in each of the optical characteristics generated in the projection optical system upon illuminating the pattern of the arbitrary reticle in the arbitrary illumination mode, based on the obtained pupil aberration map and the obtained light intensity distribution.

Exposure apparatus and method of decreasing fluctuations in optical characteristics of projection system

A scanning exposure apparatus which exposes a substrate is disclosed. The apparatus comprises an illumination system configured to illuminate an illumination region of an original, a projection optical system configured to project a pattern of the original onto the substrate, and a stop configured to shield a flare generating component of flare light which travels from the projection optical system to the substrate, and to pass the remaining component of the flare light. An aperture of the stop has a shape different from a shape of the illumination region, and the aperture of the stop includes a portion whose dimension in a first direction parallel to a scanning direction of the substrate changes in accordance with a distance from the center of the aperture in a second direction perpendicular to the first direction.

Exposure apparatus and device manufacturing method

A cooling apparatus arranged in a vacuum or reduced pressure atmosphere for use with an optical element having an illuminated area onto which light is irradiated concave part includes a temperature variation mechanism that changes a temperature of part of the cooling apparatus in a non-contact manner.

Cooling apparatus

A projection exposure apparatus including a projection optical system for projecting a pattern of a reticle onto a substrate, an optical characteristic detecting device for detecting a change in optical characteristic of the projection optical system, which change may result from the projection of the reticle pattern onto the substrate through the projection optical system, and a light detecting device for detecting at least one of (i) an intensity distribution of light from the reticle pattern, at a position adjacent to the reticle or adjacent to an imaging plane on which the reticle is to be imaged, and (ii) an intensity distribution of the light from the reticle pattern, at a position adjacent to a pupil plane of the projection optical system, wherein the optical characteristic detecting device is arranged to detect the amount of change in optical characteristic in accordance with the intensity distribution detected by the light detecting device.

Projection exposure apparatus including an optical characteristic

Growing community of inventors

Tochigi, Japan

Yasuo Hasegawa