Fuji Photo Film Company, Limited

Yasunori Takata

Shiro Tan

Toshiaki Aoai

Toru Fujimori

Masayuki Iwasaki

Yuichi Wakata

Yoshimasa Aotani

Fumiyuki Nishiyama

Sadao Fujikura

A positive photosensitive composition is disclosed which comprises a compound generating an acid upon irradiation with actinic rays or a radiation and a resin having groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution, said resin being obtained by reacting an alkali-soluble resin having phenolic hydroxyl groups with at least one specific enol ether compound under acid conditions in a specific organic solvent. The positive photosensitive composition shows improved discrimination between nonimage areas and image areas, has high sensitivity, high resolving power, and high heat resistance, suffers little change in performance with the lapse of time from exposure to light to heat treatment (PED), and is free from defects, e.g., development defects.

Positive photosensitive composition

The photosensitive resin composition of the present invention comprises an admixture of 5 to 100 weight parts of a photosensitive material having the following general formula (A) and 100 weight parts of an alkali-soluble resin: General formula (A) ##STR1## where R.sub.1 to R.sub.8 each independently represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxyl group, an aralkyl group, an aryl group, an amino group, a monoalkylamino group, a dialkylamino group, an acylamino group, an alkylcarbamoyl group, an arylcarbamoyl group, an alkylsulfamoyl group, an arylsulfamoyl group, a carboxyl group, a cyano group, a nitro group, an acyl group, an alkyloxycarbonyl group, an aryloxycarbonyl group, an acyloxy group, or --OD, --N(R)--D (where R represents a hydrogen atom or an alkyl group, and D represents a 1,2-napthoquinoediazide-5-sulfonyl group or a 1,2-napthoquinoediazide-4-sulfonyl group), and at least one of R.sub.1 to R.sub.8 represents --OD or --N(R)--D; R.sub.9 to R.sub.12 each independently represents a hydrogen atom, a lower alkyl group, or R.sub.9 and R.sub.10 and/or R.sub.11 and R.sub.12 may form a ring; R.sub.13 to R.sub.14 each independently represents a hydrogen atom, a lower alkyl group, or R.sub.13 or R.sub.14 and any of R.sub.15 or R.sub.16 may form a ring, whereas at least one of R.sub.13 to R.sub.16 is a substitution group other than hydrogen; and Z represents an oxygen atom or a single bond.

Photosensitive resin composition utilizing 1,2-naphthoquinone diazide

A photopolymerizable composition comprising an addition polymerizable unsaturated compound having at least two ethylenically unsaturated double bonds in the molecule, a photopolymerization initiator, and a binder, wherein the binder is a tetrapolymer having a weight average molecular weight of from 10,000 to 50,000 represented by formula (I): ##STR1## wherein R represents a hydrogen atom or a methyl group; and w, x, y and z each represents mol percent (mol %), w ranging from about 45 to 65; x ranging from about 5 to 18; y ranging from about 2 to 10; and z ranging from about 20 to 40 and where C.sub.4 H.sub.9 (n) represents an n-butyl group. The photopolymerizable composition can be developed with a weakly alkaline aqueous solution, has sufficient flexibility to be laminated on a base as a dry film, high adhesiveness to a base and reduced surface tackiness. It resists cold flow during preservation, has excellent resistance to swelling by a developing solution after polymerization, and rapid releasability when treated with a dilute aqueous solution of a strong alkali containing no organic solvent, and forms an image faithful to the original with a high resolving power.

Photopolymerizable composition containing a tetrapolymer binder

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Shizuoka, Japan

Yasunori Takata