Ckd Corporation

Tokyo Electron Limited

Horiba Stec, Co., Ltd.

Yasunori Nishimura

Minoru Ito

Masayuki Watanabe

Hiroki Kadoya

Tsuneyuki Okabe

Hideyuki Takeda

Shigeyuki Hayashi

Shigeyuki Okura

Hiroki Iwata

Hiroki Doi

Atsushi Ieki

Akiko Nakada

Yoji Mori

Kazutoshi Itoh

Hiroto Yasue

Shigenobu Nishida

Yukio Ozawa

Seiji Hashiguchi

Masami Nishikawa

Tsuneo Niwa

Akiko Kosaka

Nobuhiro Fukukawa

A butterfly valve includes a purge gas flow path supplying a purge gas for preventing inflow of a control fluid into a magnetic fluid sealing portion from a flow path through an insertion hole. The purge gas flow path is provided with an opening and closing valve for opening and closing the purge gas flow path and a pressure gauge for measuring a pressure value in the purge gas flow path, in the stated order from the upstream side. The purge gas flow path is connected to a portion between the magnetic fluid sealing portion and the flow path of the butterfly valve on the downstream side of the pressure gauge, and communicates with the flow path through the insertion hole. The butterfly valve further includes a control device that controls at least the opening and closing valve. The control device is provided with a monitoring program for monitoring a pressure value.

Butterfly valve

A pulse shot-type flow rate control device including first and second shutoff valves, a tank, a pressure sensor, and a controller is caused to perform two or more processes. In each process, the controller repeats pulse shots of alternately causing the first shutoff valve and the second shutoff valve to open and close, changes a way of the pulse shots based on a pressure difference between the pressure after filling and the pressure after discharge, and controls a volume flow rate. In each process, the controller stores, as an optimal filling time, a filling time when the volume flow rate is controlled to a target flow rate, and opens and closes the first shutoff valve by using the optimal filling time in a first pulse shot in the next process.

Pulse shot-type flow rate control device, pulse shot-type flow rate control method, and program

A butterfly valve has a rod connected to a DD motor and disposed along a direction orthogonal to a flow path, and a butterfly valve body that is linked to the rod and that opens and closes the flow path due to the rod being rotated by the DD motor, wherein a linking body center of gravity, which is the center of gravity of a rotating liking body having at least the rod and the butterfly valve body as constituent members, is positioned on an axial line of a rotating shaft of the DD motor.

A butterfly valve includes a drive unit and a valve unit that are coupled to each other. The drive unit includes a hollow part in which a rod is inserted between a DD motor and an end portion of the drive unit on a coupling side to the valve unit. In the hollow part, a cylindrical magnetic member is placed coaxially with the rod to cover the outer peripheral surface of the rod. A magnetic fluid is filled in a void between the outer peripheral surface of the magnetic member and the inner peripheral surface of the hollow part. The rod is made of a non-magnetic corrosion-resistant alloy.

In a non-sealed butterfly valve, a butterfly valve element includes a downstream end face that faces a downstream side of a flow passage during valve closing and a maximum outer diameter portion that makes a gap with a minimum distance. The butterfly valve element includes a first chamfered portion that reduces the diameter of the butterfly valve element from the maximum outer diameter portion to the downstream end face over the entire circumference. The first chamfered portion has a taper angle of 5&#xb0; or less relative to the thickness direction of the butterfly valve element. The first chamfered portion and the downstream end face intersect each other at a ridge line that falls within an imaginary circle that is centered on the central axis of the butterfly valve element and passes the maximum outer diameter portion.

Non-sealed butterfly valve and method for producing the same

A fluid-device connecting structure includes a first fluid device having a first connection part, a second fluid device having a second connection part, an annular seal member to connect the first and second connection parts, and a coupling member to keep the first and second connection parts in a connected state. The coupling member includes a first coupling segment and a second coupling segment, each including at one end a first hinge part or a second hinge part. The first and second connection parts each have a cylindrical outer shape. The first coupling segment has a U-like shape having an opening and surrounds the first and second connection parts over a range more than 180 degrees of an entire circumference of each of the first and second connection parts.

Coupling member, fluid-device connecting jig, and fluid-device connecting structure

In a gas flow monitoring method using a MFC (a flow control device) for controlling a flow rate of process gas from a process gas supply source and supply the process gas to a predetermined process chamber, a start shut-off valve placed upstream of the MFC, and a pressure gauge placed between the start shut-off valve and the MFC, the start shut-off valve is closed and a drop of pressure on an upstream side of the MFC is measured by the pressure gauge to measure a flow rate of the MFC, thereafter, the start shut-off valve is opened to monitor the flow rate of the MFC. The MFC is switched from an ON state to an OFF state before the start shut-off valve is opened. The method enables in-line monitoring a low rate of process gas without affecting a semiconductor manufacturing process.

Gas flow monitoring method and gas flow monitoring apparatus

A vacuum pressure control apparatus includes an annular elastic seal member formed with a valve seat, and a doubly eccentric butterfly valve element configured to come into contact or separate from the valve seat. The vacuum pressure control apparatus is to be placed on a pipe connecting a vacuum chamber and a vacuum pump. The vacuum pressure control apparatus is configured to rotate the butterfly valve element in a first direction from a first valve closed position corresponding to an initial state to change vacuum pressure in the vacuum chamber. The vacuum pressure control apparatus further includes a control unit configured to rotate the butterfly valve element in a direction opposite to a first direction so that the butterfly valve element is moved to a second valve closed position different from the first valve closed position.

Vacuum pressure control apparatus

An air-driven shutoff valve includes a valve seat formed in a main body, a valve element movable into or out of contact with the valve seat, a drive part integrally connected to the valve element, and a pilot opening/closing valve configured to supply compressed fluid to drive the drive part. The pilot opening/closing valve includes (a) a first needle valve, a first motor to change an opening degree of the first needle valve, and a first check valve allowing the compressed fluid to flow only from a pilot opening/closing valve side to a drive part side, and (b) a second needle valve, a second motor to change an opening degree of the second needle valve, and a second check valve allowing the compressed fluid to flow only from the drive part side to the pilot opening/closing valve side.

Fluid-driven shutoff valve

A flow rate controller is arranged such that a control circuit controls a proportional electromagnetic valve so that a flow rate detected by a flow rate sensor reaches a target flow rate. The proportional electromagnetic valve includes a coil supported in a holder, a bobbin and a fixed core, a valve element and a plate spring placed on a movable core, the valve seat, lead-in path, lead-out path, and orifice being formed in a body. The movable core is displaced by balance between an attractive force of the fixed core generated by excitation of the coil and an urging force of the plate spring, thereby adjusting the position of the valve element with respect to the valve seat to adjust the flow rate of a fluid. The orifice has an inside diameter set to a value of '&#x3c6;1 mm or more' and an axial length set to a value to have a ratio of 'from 0.1 to 0.6 inclusive' to the inside diameter. The lead-out path has an inside diameter set to be larger than the inside diameter of the orifice.

Flow rate controller and proportional electromagnetic valve

A fluid mixing system capable of quickly stabilizing flow rates of a plurality of fluids to be mixed is arranged to mix the fluids and deliver a mixture thereof to a container. The system includes a plurality of on-off valves for the respective fluids and delivering the fluids to the container. The on-off valves are caused to open and close in order according to respective duty ratios each indicating an opening/closing ratio in a cycle.

Fluid mixing system and fluid mixing apparatus

A liquid raw material supply unit for a vaporizer is adapted to supply a liquid raw material to the vaporizer that vaporizes the liquid raw material. The unit comprises: a manifold internally formed with a flow passage; and a plurality of fluid control valves mounted on the manifold, wherein the plurality of fluid control valves includes: a liquid raw material control valve for controlling supply of the liquid raw material to the flow passage; a cleaning solution control valve for controlling supply of a cleaning solution to the flow passage; a purge gas control valve for controlling supply of a purge gas to the flow passage; and a first introducing control valve connectable to the vaporizer for controlling supply of a fluid from the flow passage to the vaporizer, the purge gas control valve, the cleaning solution control valve, the liquid raw material control valve, and the first introducing control valve being mounted on the manifold in this order from an upstream side of the manifold, wherein the flow passage is connected to valve ports of the plurality of control valves respectively, the valve ports communicating with valve openings of the respective control valves, and the flow passage is configured to allow the purge gas supplied from the purge gas control valve to directly flow in the valve ports of the cleaning solution control valve and the liquid raw material control valve placed downstream from the purge gas control valve.

Liquid raw material supply unit for vaporizer

A solenoid valve capable of handling a corrosive control fluid and developing an increased attraction force. The solenoid valveis adapted such that a fixed core is located in a wound coiland protruding through the lower surface of the coil, a plungerholding a valve sheetis supported by a plate springunder the fixed core, the valve sheetis normally retained in contact with a valve seatby spring force of the plate spring, and the valve sheetis separated from the valve seat against the spring force of the plate springwhen the coilis energized. The fixed core comprises two parts vertically coupled, an upper one of which is a first fixed corelocated in the coilin non-contact with the control fluid, the first fixed core being made of a material having high magnetic permeability, and a lower one of which is a second fixed corefitted, protruding downward, in the coil bobbin to cover the lower end of the coil bobbin, the second fixed core being made of a material having corrosion resistance to the high-corrosive control fluid.

Growing community of inventors

Kasugai, Japan

Yasunori Nishimura