Sharp Kabushiki Kaisha Corporation

Nanosys, Inc.

Yasunobu Okada

Akihide Shibata

Hiroshi Iwata

J Wallace Parce

Paul John Schuele

David P Stumbo

Xiangfeng Duan

Hiroshi Ohki

Francisco A Leon

Jeffrey L Miller

James M Hamilton

Katsumasa Fujii

Tetsu Negishi

Samuel Edward Martin

Cheri X Y Pereira

The present invention provides methods and systems for nanowire alignment and deposition. Energizing (e.g., an alternating current electric field) is used to align and associate nanowires with electrodes. By modulating the energizing, the nanowires are coupled to the electrodes such that they remain in place during subsequent wash and drying steps. The invention also provides methods for transferring nanowires from one substrate to another in order to prepare various device substrates. The present invention also provides methods for monitoring and controlling the number of nanowires deposited at a particular electrode pair, as well as methods for manipulating nanowires in solution.

Methods for nanowire alignment and deposition

An object of the present invention is to implement a method for aligning microscopic structures in desired locations and in a desired direction, in order to align microscopic structures, such as nanostructures, with high precision. The method includes a substrate forming step of forming three electrodes to which independent potentials can be applied, a microscopic structure liquid applying step of applying a liquid in which microscopic structures are dispersed to the insulating substrate, and a microscopic structure aligning step of applying respective voltages to the three electrodes to align the microscopic structures in locations defined by the electrodes.

Method for aligning microscopic structures and substrate having microscopic structures aligned, as well as integrated circuit apparatus and display element

Growing community of inventors

Gifu, Japan

Yasunobu Okada