Mitsui Engineering and Shipbuilding Company Limited

Mitsui E&s Machinery Co., Ltd.

Mitsui Engineering & Shipbuilding

Yasunari Mori

Naomasa Miyatake

Kazutoshi Murata

Nozomu Hattori

Kyouji Doi

Takayoshi Yumii

Hiroyuki Tachibana

Kazuki Takizawa

Yumi Asano

A data processing method and a measurement device is provided in which an electromagnetic wave radiates toward an object to be measured and measurement data obtained by measuring reflected wave of the electromagnetic wave reflected from the object to be measured is processed. First processing data S(k, k, &#x3c9;) is acquired by performing discrete Fourier transform (DFT) relating to an x-coordinate component and a y-coordinate component on measurement data s(x', y&#x2032;, &#x3c9;). Then, an angular frequency &#x3c9; is converted into a kz component after extending a range from which a ky component can vary, thereby calculating second processing data S&#x2032;(kx, ky, kz). Then, the second processing data is subjected to inverse Fourier transform to calculate data f(x, y, z) of reflexibility of the object to be measured. In the extension of the ky component, local maximum value processing and a process of suppressing generation of an aliasing component using a ratio are performed.

Data processing method and the measurement device

A layer-forming device includes a feeding mechanism that feeds a substrate during layer formation, an injector unit having a plurality of injectors that supplies a layer-forming gas to the substrate, along a feeding passage of the substrate, and a reactant supply unit which generates a reactant. The injector unit supplies the reactant through gaps between the injectors to a layer of the layer-forming component. A substrate opposing surface of the injector includes a layer-forming gas supply slot through which the layer-forming gas is output, first gas exhaust slots that suck an excess gas such as the layer-forming gas, the first gas exhaust slots being provided on both sides of the layer-forming gas supply slot in a feeding direction of the substrate, and inert gas supply slots that supply an inert gas provided on far sides of the respective first gas exhaust slots away from the layer-forming gas supply slot.

Layer-forming device and injector

A layer-forming device that enables highly efficient layer formation and has a simplified configuration includes: a substrate feeding mechanism; a plasma-generating electrode; a space-partitioning wall; and a plurality of injectors. The plasma-generating electrode faces towards a feeding pathway of the substrate, and generates plasma using a reactive gas upon a supply of electric power. The space-partitioning wall is disposed between the feeding pathway and the plasma-generating electrode. A plurality of slit-shaped through-holes, through which radicals, ions generated from the plasma, or a portion of the plasma can pass, are formed at predetermined intervals in the space-partitioning wall. The plurality of injectors are sandwiched between the space-partitioning wall and the feeding pathway, such that each of the injectors is sandwiched between two adjacent through-holes from both sides of the two through-holes in the feeding direction, and the layer-forming gas is supplied toward the substrate through a layer-forming gas supply port.

Layer-forming device and layer-forming method

The planar antenna has a dielectric substrate; an antenna main body portion including first and second antenna elements on first and second sides, respectively, of the dielectric substrate and functioning as a balanced antenna; a signal line portion including first and second feed lines on the first and second sides, respectively, and a coplanar line on the first side and formed by a signal line and the first ground conductors, the signal line connected to the first feed line; a second ground conductor on the second side and connected to the second feed line; and via holes connecting the first ground conductors to the second ground conductor provided at ends of edges of the first ground conductors facing the end of the signal line where the signal line connects to the first feed line, to allow the first and second feed lines to function as balanced transmission lines.

Planar antenna and radar apparatus

An atomic layer deposition apparatus for forming a thin film on a substrate, including a first container that defines a first inner space, a second container provided inside the first container to define a second inner space, the second container being canister-shaped and including a first opening at one end thereof, a source gas that forms the thin film on the substrate flowing to the second inner space through the first opening, and a pressing member including a gas supply port for supplying the source gas to the second inner space through the first opening, the pressing member being configured to press the second container in a longitudinal direction of the second container so that the second inner space be separated from the first inner space.

Atomic layer deposition apparatus

An atomic layer deposition apparatus, which forms a thin film on a substrate, includes a first container that defines a first inner space and includes a substrate carrying-in and carrying-out port and a gas introduction port in different positions, the substrate being carried in and out through the substrate carrying-in and carrying-out port, gas being introduced through the gas introduction port to form the thin film on the substrate, a second container that is provided in the first container to define a second inner space separated from the first inner space, the second container including a first opening, a first moving mechanism that moves the second container in a predetermined direction, and a controller that controls the first moving mechanism such that the second container is moved to a first position where the substrate carrying-in and carrying-out port and the first opening are located opposite each other when the substrate is carried in and out, the controller controlling the first moving mechanism such that the second container is moved to a second position where the gas introduction port and the first opening are located opposite each other when the thin film is formed on the substrate.

Atomic layer deposition apparatus and thin film forming method

An impedance matching device is provided with a basic element having variable characteristic parameters for impedance matching, and an auxiliary element having variable characteristic parameters. At the time of generating plasma by using the impedance matching device, the characteristic parameters of the basic element of each antenna element are fixed, respectively, and the characteristic parameters of the auxiliary element are adjusted for each antenna element. Thus, in an adjusted status where impedance matching for each antenna element is adjusted, each antenna element of an antenna array is fed with a high frequency signal, an electromagnetic wave is radiated from the antenna element, the characteristic parameters of the basic element of each antenna element are synchronized and adjusted, and the impedances of the whole antenna array are matched.

Growing community of inventors

Tamano, Japan

Yasunari Mori