Hitachi-high-technologies Corporation

Yasuko Watanabe

Mitsugu Sato

Takashi Ohshima

Sukehiro Ito

Michio Hatano

Tetsuya Sawahata

Hiroyuki Honda

Disclosed is a charged particle radiation device having a charged particle source which generates a charged particle as a probe, a charged particle optical system, a sample stage, a vacuum discharge system, an aperture which restricts a probe, a conductive film, and a charged particle detector, wherein the conductive film is provided at a position excluding the optical axis of the optical system between the sample stage and the aperture; and the distance between the sensing surface of the surface of the charged particle detector and the sample stage is larger than the distance between the sample stage and the conductive film, so that the surface of the conductive film and the sensing surface of the detector are inclined.

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Mito, Japan

Yasuko Watanabe