Hitachi-high-technologies Corporation

Hitachi, Ltd.

Yasuko Aoki

Hiroshi Kitaguchi

Hiroshi Miyai

Shigeru Izumi

Katsutoshi Sato

Yukiya Hattori

Tetsuya Sawahata

Mitsugu Sato

Toshifumi Honda

Masanori Sakai

Hiroshi Kawaguchi

Makoto Hayashi

Yuta Urano

Takashi Ohshima

Shigeya Tanaka

Sukehiro Ito

Kei Shimura

Makoto Nagase

Katsumi Ohsumi

Hideo Morishita

Kenji Aiko

Michio Hatano

Yamato Asakura

Noriyuki Ohnaka

Hidefumi Ibe

Takashi Saito

Takashi Ichimura

Takeshi Ogashiwa

Kiyotomo Nakata

Shuichi Takeuchi

Masanori Takahashi

Atsushi Muto

Kazuhiko Akamine

Mine Araki

Tsutomu Tawa

Yoshimitsu Saze

The X-ray inspection device includes: an X-ray source with a focal spot size greater than the diameter of a defect for irradiating a sample with X-rays; an X-ray TDI detector arranged near the sample and having long pixels in a direction parallel to the scanning direction of the sample for detecting the X-rays emitted by the X-ray source and passing through the sample as an X-ray transmission image; and a defect-detecting unit for detecting defects based on the X-ray transmission image detected by the X-ray TDI detector.

X-ray inspection device, inspection method, and X-ray detector

The present invention provides a device for detecting foreign matter and a method for detecting foreign matter to detect a foreign matter on a surface of an object such as a film of an electrode mixture etc. or a foreign matter contained in the object, thereby to improve the reliability of the object. By irradiating an object with a terahertz illumination light(wavelength of 4 &#x3bc;m to 10 mm) and detecting a scattered lightfrom an electrodeas an example of the object by a scattered light detector, a foreign matter on a surface of the electrodeor contained in the electrode, for example, a metal foreign matter, is detected. The electrodeis one in which electrode mixture layerseach including an active material, conductive additive and a binder as components are coated on both surfaces of a collector. The scattered lightresults from a part of a transmitted lightreflected by the metal foreign matter

Device for detecting foreign matter and method for detecting foreign matter

In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (-); an aperture () that limits the diameter of the charged particle beam (); optics () for the charged particle beam; a specimen holder (); a charged particle detector () that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector. The charged particle detector () is provided with a first small detector () having a first detection sensitivity and a second small detector () having a second detection sensitivity, and makes the detection solid angle viewed from a position on the specimen, to which the charged particle beam () is to be radiated, to be the same for the first small detector () and the second small detector ().

Charged particle beam apparatus

The present invention provides a charged particle beam device in which signal electrons () are generated from a sample when the sample () is irradiated with a primary charged particle beam (), and then enter different positions of a position-sensitive signal detector () in accordance with energy of the signal electrons (), whereby an energy distribution image of the signal electrons generated from the sample is acquired. Accordingly, it becomes possible to discriminate and select signal electrons having arbitrary energy to thereby obtain an image to which information specific to the arbitrary energy is reflected, and to acquire various characteristic information of the sample.

Charged particle beam device

An object of the present invention is to provide a scanning electron microscope including decelerating-electric-field forming means for decreasing the energy of a beam of electrons reaching a sample, and being capable of selectively detecting BSEs with high efficiency. To this end, the scanning electron microscope including the decelerating-electric-field forming means has a detector for detecting electrons. The detector includes a part for receiving the electrons at a position which is positioned outside trajectories of SEs accelerated by the decelerating-electric-field forming means, and which is further away from the optical axis of the beam of electrons than the trajectories of the SEs.

Scanning electron microscope

The present invention is to provide an electron-beam lithography method and an electron-beam lithography apparatus that can draw patterns with a high precision despite a change in barometric pressure, can ensure a satisfactory throughput, and are inexpensive. In the electron-beam lithography method that uses an electron beam to draw patterns on a sample, a difference between a current measured barometric pressure and a previous measured barometric pressure, and an elapsed time between their barometric pressure-measurement points in time are determined. When the rate of the difference of their barometric pressures with respect to the elapsed time is equal to or larger than a prescribed barometric pressure change rate value, a drawing precision is calibrated.

Method and apparatus for electron-beam lithography

A non-destructive inspection apparatus has a radiation source, a radiation detector, a radiation source diver, a detector driver, a drive controller, a delay circuit, a radiation signal processing circuit, a memory, a computer, a display device, and an input device. The radiation detector consists of one-dimensional or two-dimensional array of detectors having a long collimator whose pores are in parallel with the radiation angle of the radiation emitted in an angular pattern from the radiation source, whereby a transmission image of a large size structure can be obtained at high speed and with a high resolution. Furthermore, the detect position in an inspection object can be specified by analyzing a plurality of specified transmission images using the inspection apparatus.

Non-destructive inspection apparatus and inspection system using it

A water chemistry factor which is specific to a specific portion of a primary cooling system and universal is decided to be a standard target. The concentration of an agent for mitigating corrosion damage of structural material of the primary cooling system is controlled so that the target will be in a desirable range. All sensor groups provided in the primary cooling system are separated into sensor groups in different lines, of which a specific sensor group are connected to an arithmetic unit and a data base and are for always monitoring a plant process. For example, concentration distribution agreed with measured value oxidation component in the reactor water at the measurement points is selected from the data base, and it is used to estimate the standard target.

Nuclear power plant having a water chemistry control system for a

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Hitachi, Japan

Yasuko Aoki