Mitsubishi Denki Kabushiki Kaisha

Other

Yasuhito Myoi

Masaaki Tanaka

Teruo Miyamoto

Kazuya Kamon

Fumio Suzuki

Masaki Kuzumoto

Shigenori Yagi

Toshimasa Tomoda

Toshiyuki Yoneda

Nobuyuki Zumoto

Haruhiko Nagai

Masanori Kojima

Kazuki Kuba

Toshinori Yagi

Yoshisuke Ohtsuru

Masao Izumo

Yoshie Noguchi

Kenji Kimura

Toshio Ito

Yutaka Mihashi

Hiroshi Kawamura

Toshitaka Aoyagi

Koji Yasui

Kenji Samejima

Shuji Iwata

Takayoshi Semasa

Kazuaki Matoba

Atsushi Itoh

Hiroshi Mitsuda

Yoshito Seiwa

Naoki Kawamoto

Ko Nishino

Kenji Maeno

Takio Okuda

Toshio Itoh

Toyomi Ohshige

Kenji Tatsumi

Fumio Itoh

Miki Fukada

Hisao Koizumi

Tsunehiro Imamura

Yoshie Uchiyama

Yoshisuke Otsuru

Kou Nishino

To provide a planar light source device capable of preventing abnormal light emittance at a vicinity of a lamp without causing deterioration in brightness and disadvantage in view of structure and a liquid crystal display having high display grade, by projecting a reflection sheet from a light guiding plate to inside of a lamp reflector and providing notch portions at both end portions of the reflection sheet projected to inside of the lamp reflector , interference between the projected reflection sheet and electrode portions or lamp holders at both ends of the lamp is prevented from causing.

Planar light source device and liquid crystal display using the same

A plurality of liquid crystal modules is vertically and horizontally arranged, each of which is supplied light by a light source via optical fibers. A screen can be wound up at a cabinet. An image from each of the plurality of liquid crystal modules does not interfere one another because a light shielding board is installed.

Image display system

A dichroic mirror for reflecting red light for optical separating and a dichroic mirror for reflecting red light for optical synthesizing are installed on the same plane in an image generating apparatus of the present invention. In addition, a dichroic mirror for reflecting blue light for optical separating and a dichroic mirror for reflecting blue light for optical synthesizing are installed on the same plane. Accordingly, a compact configuration can be realized. Since a main reflecting mirror is a rotating elliptic mirror and a lamp is located on a focus or around the focus, a lighting equipment which irradiates conic luminous flux can be realized.

Method and apparatus for image generation

A polarizing beam splitter extracts orthogonally polarized light beams from natural light and distributes those to liquid crystal panels, which modulate polarization states of those polarized light beams in accordance with a luminance signal and chrominance signals of video signals, respectively. The modulated light beams are combined by the same polarizing beam splitter, and the combined light is enlarged and projected onto a screen by a projection lens, to reproduce a projected image.

Projector apparatus

An optical processing apparatus utilizing multiple reflections of a light beam between a mask and a reflector has improved uniformity in the distribution of the light beam over a surface of the mask. In one form, the reflector is disposed in a face-to-face relation with respect to the mask with an angle of inclination relative thereto. In another form, the reflector has a flat or curved taper surface for decreasing an angle of reflection of the light beam at the mask surface at an initial stage, and a flat surface disposed in parallel with the mask surface. In a further form, the reflector is curved in a direction of transmission of the light beam. In a yet further form, an angle of incidence of the light beam is properly adjusted such that a portion of the light beam, which is first reflected from the mask and escapes outwardly from the reflector, is minimized.

Optical processing apparatus

A projection exposure apparatus for use in LSI production comprises a light source, a light condensing optical system through which light from the light source is condensed and applied to a mask carrying a circuit pattern, a projection lens system which projects the light transmitted through the mask onto the surface of a wafer, and an aperture member which is interposed between the light source and the light condensing optical system. The aperture member has a light transmission region for transmitting the light from the light source and a light-interrupting member disposed to extend across the light transmission region. The shape or configuration of the light-interrupting member is determined in accordance with the geometry of the circuit pattern formed on the mask.

Projection exposure apparatus

A projection aligner includes a light source, a condenser lens system for directing light from the light source onto a mask on which a circuit pattern is formed, a projecting lens system for collecting on the surface of a wafer the light transmitted through the mask, and an aperture member disposed between the light source and the condenser lens system. The aperture member includes a transmitting zone for transmitting light from the light source and a phase shift member for producing a predetermined phase difference between light transmitted through the transmitting zone and light transmitted through a region surrounding the transmitting zone.

Projection aligner

An optical machining apparatus for irradiating light from a light source onto a source to be machined to form a grooves in the surface. The apparatus uses a mask disposed in the path of light from the light source. The mask includes reflective parts for reflecting the light from the light source. The reflective parts are on a first surface of the mask. The mask also includes a reflection member for returning the light reflected at the reflective parts of the mask toward the mask.

Optical machining apparatus

A projection aligner includes a light source, a condenser lens system for directing light from the light source onto a mask on which a circuit pattern is formed, a projecting lens system for collecting on the surface of a wafer the light transmitted through the mask, and a pupillary member disposed on a pupillary surface of the projecting lens system. The pupillary member includes at least one transmitting zone for transmitting the light transmitted through the mask including a phase shift member for producing a predetermined phase shift in light transmitted through part of the transmitting zone.

A laser device comprises a laser medium, a semiconductor light-emitting element for exciting the laser medium, a reflecting surface surrounding the outer periphery of the laser medium along its optical axis, and an opening provided in a part of the reflecting surface for causing light from the semiconductor light-emitting element to be incident upon the laser medium. The laser device is improved further by providing a polarizing plate and a light guide between the light-emitting element and the laser medium and by deviating the optical axis of excitation light from the central axis of the laser medium.

Laser device with high oscillation efficiency

A laser apparatus has a phase regulator for regulating phase of output laser beam is provided, in which a full reflection portion of an output mirror is made partially reflective and a relative optical length thereof to a non-reflection portion of the output mirror is regulated by a relative thickness thereof. In one aspect of the invention, a coating provided on a center portion of an inner surface of an output mirror of a resonator comprises a partially reflective coating and a phase difference between laser beam portions passing through the center portion and a surrounding portion is regulated by a thin membrane having same refraction index as that of a matrix of the output mirror and provided between the matrix and a coating on either surface of the output mirror.

Laser apparatus

Growing community of inventors

Amagasaki, Japan

Yasuhito Myoi