Canon Kabushiki Kaisha

Yasuhisa Inao

Natsuhiko Mizutani

Takako Yamaguchi

Ryo Kuroda

Tomohiro Yamada

Toshiki Ito

Tatsuro Uchida

Mitsuhiro Ikuta

Masaya Ogino

Shinji Nakasato

Yasuhiro Shimada

Shinya Tanaka

Kenji Saito

Junichi Seki

Takeshi Uchida

Toshiharu Sumiya

Yohei Saito

Takashi Naba

Tomasz Bajraszewski

Tomasz Dziubak

Koichi Ohta

Taro Fukasawa

Marek Rozanski

Hayato Shioda

Toshihiro Fuse

An image processing apparatus includes an acquisition unit that acquires a plurality of pieces of tomographic data indicating tomographic information on substantially the same part of a subject to be inspected, a threshold calculation unit that calculates a threshold from tomographic data associated with a target pixel for which motion contrast data is to be calculated of the plurality of pieces of tomographic data, and a pixel value calculation unit that calculates the pixel value of the target pixel of a motion contrast image based on the threshold and the motion contrast data calculated from the tomographic data associated with the target pixel.

Image processing apparatus, optical coherence tomography apparatus, image processing method, and computer-readable medium

An image processing apparatus that processes an image generated using at least one item of three-dimensional tomographic data out of a plurality of items of three-dimensional tomographic data obtained by conducting a plurality of optical coherence tomography scans of a subject at different times using measuring light controlled to scan a same position of the subject includes: a front image generating unit configured to generate a front image of the subject using the at least one item of three-dimensional tomographic data; a motion contrast image generating unit configured to generate a motion contrast image of the subject using the plurality of items of three-dimensional tomographic data; and a display control unit configured to display the front image on a display unit before displaying the motion contrast image.

Image processing apparatus and image processing method with generating motion contrast image using items of three-dimensional tomographic data

An imaging apparatus includes a converter configured to convert an analog signal obtained from detected interference light into a digital signal and a clock generator configured as an interferometer including an optical path through which part of light emitted from a light source passes, the optical path being split into a first optical path and a second optical path having an optical path length difference therebetween, to generate a clock used by the converter sampling the analog signal at a frequency corresponding to the optical path length difference. The converter includes n A/D converters, n being an integer of at least 2, and is configured to change phases of n clocks obtained from the clock to produce a phase difference therebetween, and to generate a clock having an n-times frequency from the n clocks and n analog signals obtained from the analog signal using the n A/D converters.

Imaging apparatus

An ophthalmic imaging apparatus that captures a tomographic image of an subject's eye based on light obtained by combining a return light with a reference light, the return light being from the subject's eye when irradiated with a measurement light, the reference light corresponding to the measurement light includes a first optical fiber disposed in an optical path of the reference light and including a light guide portion for guiding the reference light, and a second optical fiber disposed in an optical path of the measurement light and including a light guide portion for guiding the measurement light, wherein a diameter of each of the light guide portions of ejection ends of the first optical fiber and the second optical fiber is larger than a diameter of a light guide portion in a position different from a position of each of the ejection ends.

Ophthalmic imaging apparatus

An image processing apparatus includes a processor that acquires a plurality of sets of tomographic signals acquired by an image sensor, and generates a representative value in each pixel position of the tomographic image, using the plurality of sets of tomographic signals, and generates the tomographic image with the representative value in each pixel position as a pixel value by determining a target region in which contrast is reduced in the tomographic image, using at least one set of tomographic signals, out of the plurality of sets of tomographic signals, and estimating an estimation value, in each pixel position of the target region, by performing statistical processing on a plurality of tomographic signals corresponding to the pixel position, out of the plurality of sets of tomographic signals. The tomographic image is generated with the estimation value as the representative value in the target region.

Image processing apparatus that generates a tomographic image using an estimation value of pixel values, and related optical coherence tomography apparatus, image processing method, and computer-readable storage medium

A surface emitting laser having a mesa structure includes an off-orientation substrate, a bottom reflection mirror, an active layer, a current confinement layer, a top reflection mirror, and a surface-relief structure. The central axis of a high-reflectivity region of the surface-relief structure and the central axis of the mesa structure do not coincide with each other.

Surface emitting laser

An optical filter that transmits light of the visible light region includes a dielectric substrate; a dielectric layer that is formed on a surface of the dielectric substrate; and a first metal structure group in which a plurality of first metal structures are arranged two-dimensionally in an isolated state in the in-plane direction of the dielectric substrate, that is provided between the dielectric substrate and the dielectric layer, comprising: the first metal structures having first and second lengths in first and second directions orthogonal to each other, which lengths are equal to or less than a first wavelength in the visible light region; and a transmittance of the first wavelength being reduced or a reflectance being increased by surface plasmons induced on a surface of the first metal structures by resonance between light incident on the dielectric substrate or the dielectric layer and the first metal structures.

Optical filter

Provided is a method of manufacturing a surface-emitting laser capable of preventing characteristics fluctuations within the plane and among wafers and oscillating in a single fundamental transverse mode. The method includes after performing selective oxidation: exposing a bottom face of a surface relief structure by etching a second semiconductor layer with a first semiconductor layer where a pattern of the surface relief structure has been formed as an etching mask and a third semiconductor layer as an etching stop layer; and exposing a top face of the surface relief structure by etching the first semiconductor layer where the pattern of the surface relief structure has been formed, with the second semiconductor layer and the third semiconductor layer as etching stop layer.

Surface-emitting laser and surface-emitting laser array, method of manufacturing a surface-emitting laser and method of manufacturing a surface-emitting laser array, and optical apparatus including a surface-emitting laser array

Provided is a surface emitting laser manufacturing method, etc., which reduces process damage occurring to a surface relief structure, enabling stable provision of a single transverse mode characteristic. Provided is a method including a surface relief structure for controlling a reflectance in a light emitting portion of an upper mirror, the surface relief structure including a stepped structure, includes: forming a resist pattern including a pattern for forming a mesa structure and a pattern for forming a stepped structure, on or above the upper mirror, and performing first-phase etching for etching the surface layer of the upper mirror to determine the horizontal position of the stepped structure; forming a current confining structure after the performing first-phase etching; and performing second-phase etching for further etching the area that the first-phase etching has been performed, to determine the depth position of the stepped structure, after the forming a current confining structure.

Surface emitting laser manufacturing method, surface emitting laser array manufacturing method, surface emitting laser, surface emitting laser array, and optical apparatus including surface emitting laser array

A near-field exposure apparatus includes a near-field exposure mask and a mechanism places a substrate, to be exposed, opposed to the near-field exposure mask. A mechanism performs relative alignment of the near-field exposure mask and the substrate to be exposed. A mechanism closely contacts the near-field exposure mask and the substrate to be exposed, with each other. A mechanism projects exposure light to the near-field exposure mask, and a soft X-ray irradiating device removes static electricity charged in at least one of the near-field exposure mask and the substrate to be exposed. The soft X-ray irradiating device is disposed such that the near-field exposure mask is located between the soft X-ray irradiating device and the substrate to be exposed.

Near-field exposure apparatus and near-field exposure method

A near-field exposure apparatus for exposing a substrate to light via an exposure mask under a condition that the exposure mask is close to the substrate. The apparatus includes a pressure adjustable container to control a relative position of the exposure mask to the substrate by adjusting a pressure of the pressure adjustable container. The pressure adjustable container has a structure adapted to be tightly closed with the exposure mask being held mounted so as to prevent volatile substances or foreign substances from entering into the pressure adjustable container. The pressure of the pressure adjustable container is adjustable through a change in capacity of the pressure adjustable container.

Device and method for controlling close contact of near-field exposure mask, and near-field exposure mask for the same

An exposure apparatus to be used with an exposure mask having an elastically deformable holding member and a light blocking film provided on the holding member and being formed with an opening pattern. For exposure, the mask is flexed, to be brought into contact with an object to be exposed. The apparatus includes a distance detecting device for detecting a distance between the exposure mask and the object to be exposed. The distance detecting device is adapted to detect the distance between the exposure mask and the object to be exposed before the exposure mask is flexed. The apparatus also includes a distance controlling device for controlling the distance between the exposure mask before the mask is flexed and the object to be exposed, on the basis of a signal from the distance detecting device.

Exposure apparatus, exposure method, and exposure mask

A near-field exposure method includes closely contacting an exposure mask having a light blocking film with small openings, to a photoresist layer formed on a substrate having surface unevenness, and projecting the exposure light of the exposure light source onto the exposure mask so that the photoresist is exposed based on near-field light escaping from the small openings, wherein the near-field exposure is carried out under a condition that a contact region where the light blocking film and the photoresist layer are in contact with each other and a liquid region filled with a liquid between the light blocking film and the photoresist layer coexist between the light blocking film and the photoresist layer.

Growing community of inventors

Tokyo, Japan

Yasuhisa Inao