Kao Corporation

Yasuhiro Yoneda

Ryoichi Hashimoto

Toshiya Hagihara

Mami Shirota

Hiroyuki Yoshida

Tetsuo Takano

Kazuo Kubota

Kanji Sato

Provided is a method for producing a polishing composition capable of reducing scratches and particles of an object to be polished, after polishing. It is a method for producing a polishing composition including a step of filtering with a filtration filter a silica particle dispersion containing colloidal silica whose primary particles have an average particle diameter in a range of 1 to 100 nm, wherein the filtration filter includes diatomite cationized by use of a polyvalent amine compound having 9 to 200 cationic groups in the molecule.

Method for producing polishing liquid composition

A polishing liquid composition includes composite oxide particles containing cerium and zirconium, a dispersing agent, and an aqueous medium. A powder X-ray diffraction spectrum of the composite oxide particles obtained by CuK&#x3b1;1 ray (&#x3bb;=0.154050 nm) irradiation includes a peak (first peak) having a peak top in a diffraction angle 2&#x3b8; (&#x3b8; is a Bragg angle) range of 28.61 to 29.67&#xb0;, a peak (second peak) having a peak top in a diffraction angle 2&#x3b8; range of 33.14 to 34.53&#xb0;, a peak (third peak) having a peak top in a diffraction angle 2&#x3b8; range of 47.57 to 49.63&#xb0;, and a peak (fourth peak) having a peak top in a diffraction angle 2&#x3b8; range of 56.45 to 58.91&#xb0;. A half-width of the first peak is 0.8&#xb0; or less.

Polishing liquid composition

A polishing composition containing at least one or more aminocarboxylic acids selected from the group consisting of serine, cysteine and dihydroxyethylglycine, ceria particles and an aqueous medium; a polishing process of a semiconductor substrate, including the step of polishing a semiconductor substrate with a polishing composition for a semiconductor substrate, containing at least one or more aminocarboxylic acids selected from the group consisting of serine, cysteine and dihydroxyethylglycine, ceria particles and an aqueous medium; a method for manufacturing a semiconductor device including the step of polishing a semiconductor substrate having a film formed on its surface, the film containing a silicon atom and having a shape with dents and projections, with a polishing pad pressed against a semiconductor substrate at a polishing load of from 5 to 100 kPa in the presence of a polishing composition for a semiconductor substrate, containing at least one or more aminocarboxylic acids selected from the group consisting of serine, cysteine and dihydroxyethylglycine, ceria particles and an aqueous medium.

Polishing process of a semiconductor substrate

A polishing liquid composition is applicable as a means of forming embedded metal interconnections on a semiconductor substrate. In a surface to be polished comprising an insulating layer and a metal interconnection layer, the polishing liquid composition is capable of maintaining a polishing speed of the metal layer, of suppressing an etching speed, and of preventing dishing of the metal layer.

A polishing composition comprising an improver of a ratio of a polishing rate of an insulating film to that of a stopper film, wherein the polishing rate of the stopper film is selectively decreased, comprising one or more compounds selected from the group consisting of a monoamine or diamine compound; a polyamine having three or more amino groups in its molecule; an ether group-containing amine; and a heterocyclic compound having nitrogen atom. The polishing composition can be used for removing an insulating film which has been embedded for isolation into a trench formed on a silicon substrate and sedimented outside the trench, thereby planing a surface of the silicon substrate.

Polishing composition

The present invention provides a spacer for a liquid crystal display which is excellent in light shielding properties, does not suffer from fading even after the lapse of a long period, thus being excellent in long-term reliability, and has satisfactory strengths and a liquid crystal display made by using the spacer. The above spacer is composed of colored fine particles prepared by copolymerizing a polymerizable anthraquinone dye having at least one ethylenically unsaturated bond in the molecule with an ethylenically unsaturated monomer component in an aqueous medium.

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Wakayama, Japan

Yasuhiro Yoneda