Kioxia Corporation

Toshiba Memory Corporation

Kabushiki Kaisha Toshiba

Yasuhiro Uchiyama

Masaru Kito

Keisuke Nakatsuka

Fumitaka Arai

Shinya Arai

Shigeki Kobayashi

Satoshi Nagashima

Hiroshi Itokawa

Kotaro Fujii

Kenta Yamada

Ryosuke Sawabe

According to one embodiment, there is provided a semiconductor memory device including a first chip, a second chip and a third chip. In the first chip, plural first conductive layers are stacked via a first insulating layer. In the second chip, plural second conductive layers are stacked via a second insulating layer. A number of stack layers in the plural first conductive layers and a number of stack layers in the plural second conductive layers are different from each other.

Chip bonded semiconductor memory device with different charge storage films

A semiconductor storage device includes: a stacked body having a plurality of insulating layers and a plurality of gate electrode layers alternately stacked in a first direction, the plurality of gate electrode layers including a first gate electrode layer and a second gate electrode layer, the second gate electrode layer adjacent to the first gate electrode layer in the first direction, and the plurality of insulating layers including a first insulating layer located between the first gate electrode layer and the second gate electrode layer; a semiconductor layer extending in the first direction; a first charge storage layer disposed between the semiconductor layer and the first gate electrode layer, the first charge storage layer including silicon and nitrogen; a second charge storage layer disposed between the semiconductor layer and the second gate electrode layer, the second charge storage layer sandwiching the first insulating layer with the first charge storage layer.

Semiconductor storage device and method of manufacturing the same

According to one embodiment, a semiconductor device includes a substrate, a logic circuit provided on the substrate, and a memory cell array provided over the logic circuit that includes a plurality of electrode layers stacked on top of one another and a semiconductor layer provided over the plurality of electrode layers. The semiconductor device further includes a first plug and a second plug provided above the logic circuit and electrically connected to the logic circuit, a bonding pad provided on the first plug, and a metallic wiring layer provided on the memory cell array, electrically connected to the semiconductor layer, and electrically connected to the second plug.

Semiconductor device and method for manufacturing the same

A semiconductor memory device comprises a semiconductor, a first insulator, a second insulator, a first conductor, a third insulator, a fourth insulator, and a fifth insulator. The first insulator is on the semiconductor. The second insulator is on the first insulator. The third insulator is on the first conductor. The fourth insulator is between the second insulator and the first conductor. The fifth insulator is provided between the second insulator and the third insulator. The fifth insulator is having an oxygen concentration different from an oxygen concentration of the fourth insulator.

Semiconductor memory device

A semiconductor memory device includes a first electrode film, a second electrode film separated from the first electrode film in a first direction, a third electrode film separated from the second electrode film in the first direction, a fourth electrode film separated from the third electrode film in the first direction, and a first and a second semiconductor members extending in the first direction. The second electrode film includes a first conductive portion, an insulating portion, and a second conductive portion arranged along a second direction. The first semiconductor member pierces the first, third and fourth electrode films and the insulating portion of the second electrode film. The second semiconductor member pierces the first, third and fourth electrode films, and the first conductive portion or the second conductive portion of the second electrode film.

Semiconductor memory device including artificial drain select gate and method for driving same

According to one embodiment, a semiconductor memory device includes: first and second signal lines; a first memory cell storing first information by applying voltage across the first signal line and a first interconnect layer; a second memory cell storing second information by applying voltage across the second signal line and a second interconnect layer; a first conductive layer provided on the first and second signal lines; third and fourth signal lines provided on the first conductive layer; a third memory cell storing third information by applying voltage across the third signal line and a third interconnect layer; and a fourth memory cell storing fourth information by applying voltage across the fourth signal line and a fourth interconnect layer.

A semiconductor memory device includes: a first conductive layer and a first insulating layer extending in a first direction, these layers being arranged in a second direction intersecting the first direction; a first semiconductor layer opposed to the first conductive layer, and extending in a third direction intersecting the first and second directions; a second semiconductor layer opposed to the first conductive layer, extending in the third direction; a first contact electrode connected to the first semiconductor layer; and a second contact electrode connected to the second semiconductor layer. In a first cross section extending in the first and second directions, an entire outer peripheral surface of the first semiconductor layer is surrounded by the first conductive layer, and an outer peripheral surface of the second semiconductor layer is surrounded by the first conductive layer and the first insulating layer.

A semiconductor memory device includes a substrate; a stacked body on the substrate and including a first stacked body formed of stacked first electrode layers and a second stacked body on the first stacked body and including a second electrode layer; a hole passing through the stacked bodies in a first direction and having a first insulator, and a channel film between the first insulator and first electrode layers and between the first insulator and second electrode layer and having first and second portions facing each other, with the first insulator placed therebetween. A first memory between the first electrode layers and the first portion and a second memory between the first electrode layers and the second portion are insulated. A third memory between the second electrode layer and the first portion and a fourth memory between the second electrode layer and the second portion are connected.

A semiconductor memory device includes a substrate, a plurality of first control gate electrodes, a plurality of second control gate electrodes, first to second select gate electrodes, first to second gate electrodes, a bit line, first to second semiconductor pillars, and a controller. The controller applies a first potential to the first select gate electrode, a third potential lower than the first potential to the second select gate electrode, a second potential to the first gate electrode and the second gate electrode, a selecting potential not less than the third potential to one of the plurality of the first control gate electrodes, and an unselecting potential higher than the selecting potential to other than the one of the plurality of first control gate electrodes in a reading operation.

Growing community of inventors

Yokkaichi, Japan

Yasuhiro Uchiyama