Fuji Photo Film Company, Limited

Yasuhiro Nakayama

Masakazu Yoneyama

Nobuo Yamamoto

Yasuo Mukunoki

Shinzo Kishimoto

Naohiko Sugimoto

Ikutaro Horie

Keiichi Adachi

Takashi Nakamura

Shigeki Yokoyama

Shoji Ishiguro

Haruhiko Iwano

Akira Kitada

Kiyotaka Hori

Hideo Miyazaki

Akira Abe

Kameji Nagao

Takashi Fujioka

Yuzo Toda

Yasuo Takahashi

A method of removing silver from a solution containing silver halide and silver ion is described, which comprises a step of adding an a sulfur atom-containing hydrophilic polymer chelating agent to the solution.

Methods of removing silver

A photographic silver halide light-sensitive material is described. The material is comprised of a support with at least one gelatin-containing hydrophilic layer provided thereon. The gelatin-containing hydrophilic layer contains a styrene-butadiene copolymer latex. With this photographic silver halide light-sensitive material, the formation of fog and desensitization occur less if it is bent or sucked during the production, working, and development thereof. There is thus provided a light-sensitive material which is improved in its resistance against mechanical stresses without causing a loss of transparency during development, and further, without increasing its surface electric resistance.

Photographic silver halide light-sensitive material

A photographic light-sensitive material is described comprising a support having thereon a silver halide emulsion layer, said material including at least one hydrophilic colloid layer containing at least 0.1 g/m.sup.2 of a water-soluble polymer having a molecular weight of from 10,000 to 500,000 and consisting essentially of a repeating unit represented by formula (I) ##STR1## wherein R represents a hydrogen atom, a halogen atom, or an alkyl group; L represents a single chemical bond or a divalent connecting group; M represents a hydrogen atom, an ammonium ion, or an alkali metal ion; X represents from 10 to 100 mol%; y represents from 0 to 90 mol%; and A represents a copolymerized monomer unit derived from a copolymerizable ethylenically unsaturated monomer. The photographic light-sensitive material has improved antistatic properties without damaging other photographic properties.

Photographic light-sensitive material

A photographic light-sensitive material with improved antistatic properties comprising a support having thereon at least one hydrophilic colloid layer containing

Photographic light-sensitive material with three surface active agents

A photographic light-sensitive material containing in at least one layer a compound represented by the following formula:

Photographic light-sensitive antistatic containing material

A silver halide photographic light-sensitive material comprising a support having thereon at least one light-sensitive silver halide emulsion layer and a surface layer thereof containing an organic fluoro-compound and a carboxy group-containing compound, resulting in an improvement in the physical characteristics of the surface.

A method for preventing the degradation of a hydrophilic colloid solution for a silver halide photographic light-sensitive material of which the viscosity has been or is to be increased using an anionic polymer containing an acid group, which comprises incorporating into the hydrophilic colloid solution at least one compound represented by the formula (I): ##STR1## wherein R.sub. represents a hydrogen atom or an alkyl group; and R.sub.2, R.sub.3 and R.sub.4, which may be the same or different, each represents a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group.

Method for preventing the degradation of a hydrophilic colloid solution

A photographic light-sensitive material comprising a support having thereon at least one light-sensitive silver halide emulsion layer and with at least one photographic layer of the photographic light-sensitive material containing a liquid organopolysiloxane having therein at least one siloxane unit, in which (1) a methyl group and (2) an alkyl group, a cycloalkyl group, an alkoxyalkyl group, an aralkyl group, an aryloxyalkyl group or a 2,3-epoxypropyloxyalkyl group with each group having at least 5 carbon atoms are attached to the silicon atom of the siloxane unit.

Photographic light-sensitive material containing liquid

An antistatic photographic sensitive material comprising a support having thereon at least one silver halide emulsion layer, wherein a surface active copolymer containing in the main chain a repeating unit represented by the formula (I) ##EQU1## wherein Y represents an organic residue having 4 to 22 carbon atoms; n represents the average number of ethyleneoxy units and is 1 to 100; and M represents a hydrogen atom, an alkali metal atom, an alkaline earth metal atom, an ammonium group or an alkylammonium group is present in at least one of a surface of the support and a photographic layer.

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Fujinomiya, Japan

Yasuhiro Nakayama