Shimadzu Corporation

Nippon Pillar Packing Co., Ltd.

Nippon Packing Co., Ltd.

Yasuhiro Akune

Kichiya Tanino

Masaru Koeda

Tetsuya Nagano

Kazuo Sano

Eiji Ishiguro

The present invention discloses diffraction gratings which do not generate any thermal strain and can perform extremely high-precision and high-efficiency diffraction nearly free from scattered beams. The diffraction gratings are built by allowing the chemically deposited film of silicon carbide whose crystal planes are strongly oriented to the (220) planes in terms of Miller indices to form on the substrate comprising sintered silicon carbide, polishing the surface of the deposited film to 5 .ANG. RMS or less, and directly etched laminar-type grating grooves on that surface by using ion-beam etching.

Diffraction grating

A composite material for use as a construction material for high energy density beam reflectors and for other purposes, comprising a substrate and a chemically vapor deposited layer of silicon carbide formed thereon, wherein the crystal faces in said chemically vapor deposited layer of silicon carbide are oriented to the (220) plane as indicated by Miller indices.

Composite material with chemically vapor deposited layer of silicon

Growing community of inventors

Hyogo, Japan

Yasuhiro Akune