Jsr Corporation

Yasuhiko Matsuda

Takanori Kawakami

Kazuki Kasahara

Hiromitsu Nakashima

Masafumi Hori

Ken Maruyama

Hiroki Nakagawa

Norihiko Ikeda

Kazuo Nakahara

Yuusuke Asano

Yoshifumi Oizumi

Mitsuo Satou

Mitsuo Sato

Norihiko Sugie

Takuma Ebata

Kaori Sakai

Tomohiro Kakizawa

Takakazu Kimoto

Tomohisa Fujisawa

Yukari Hama

Saki Harada

Kenji Hoshiko

A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. Rrepresents an alkali-labile group. A represents an oxygen atom, &#x2014;NR'&#x2014;, &#x2014;CO&#x2014;O&#x2014;or &#x2014;SO&#x2014;O&#x2014;, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R&#x2032; represents a hydrogen atom or an alkali-labile group, and '#' and '##' each indicate a bonding hand bonded to R.-A-R&#x2003;&#x2003;(x).

Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound

A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. Rrepresents an alkali-labile group. A represents an oxygen atom, &#x2014;NR'&#x2014;, &#x2014;CO&#x2014;O&#x2014;or &#x2014;SO&#x2014;O&#x2014;, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R&#x2032; represents a hydrogen atom or an alkali-labile group, and '#' and '##' each indicate a bonding hand bonded to R. 

A radiation-sensitive resin composition includes a compound represented by a following formula (1), and a first polymer that serves as a base resin. Rrepresents a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, or the like. The Mrepresents a monovalent cation. The first polymer (B) is preferably insoluble or hardly soluble in alkali, the polymer including a structure unit represented by a formula (5) or a structure unit represented by a formula (6), and a structure unit represented by a formula (7). 

Radiation-sensitive resin composition

A radiation-sensitive resin composition includes a polymer component, a radiation-sensitive acid generating agent, and a nitrogen-containing compound having a ring structure. The polymer component includes, in an identical polymer or different polymers, a first structural unit represented by a formula (1) and a second structural unit represented by a formula (2). Rrepresents a hydrogen atom or a methyl group. Z is a group which represents a divalent monocyclic alicyclic hydrocarbon group taken together with R. Rrepresents a carbon atom. Rrepresents a methyl group or an ethyl group. Rrepresents a hydrogen atom or a methyl group. X is a group which represents a divalent bridged alicyclic hydrocarbon group having no less than 10 carbon atoms taken together with R. Rrepresents a carbon atom. Rrepresents a branched alkyl group having 3 or 4 carbon atoms. 

Radiation-sensitive resin composition, polymer, and resist pattern-forming method

The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. Rrepresents a hydrogen atom, a methyl group or a trifluoromethyl group. Rrepresents a single bond or a divalent linear, branched or cyclic, saturated or unsaturated hydrocarbon group having 1-20 carbon atoms. X represents a fluorine atom-substituted methylene group or a linear or branched fluoroalkylene group having 2-20 carbon atoms. Rrepresents a hydrogen atom or a monovalent organic group. 

Radiation-sensitive resin composition, polymer, and method for forming resist pattern

A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. Rrepresents an alkali-labile group. A represents an oxygen atom, &#x2014;NR'&#x2014;, &#x2014;CO&#x2014;O&#x2014;or &#x2014;SO&#x2014;O&#x2014;, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R&#x2032; represents a hydrogen atom or an alkali-labile group, and '#' and '##' indicates a bonding hand bonded to R.-A-R&#x2003;&#x2003;(x)

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Tokyo, Japan

Yasuhiko Matsuda