Asahi Glass Company, Limited

Yasuhide Kawaguchi

Isamu Kaneko

Yoko Takebe

Shinji Okada

Shun-ichi Kodama

Osamu Yokokoji

Daisuke Shirakawa

Katsuya Ueno

Kentaro Tsunozaki

Yoshihiko Sakane

Akihiko Asakawa

Hideshi Sasakura

Hideo Nomoto

To provide a photocurable composition whereby it is possible to obtain a cured product having both a release property and flexibility, and a process whereby it is possible to produce a flexible molded product having on its surface a fine pattern having a reverse pattern of a mold precisely transferred. A photocurable composition comprising a compound (A) having at least two urethane bonds and at least two (meth)acryloyloxy groups and having a mass average molecular weight of less than 2,000, a compound (B) having a fluorine atom and at least one carbon-carbon unsaturated double bond, a compound (C) having one (meth)acryloyloxy group, a photopolymerization initiator (D), and a fluorinated surfactant (E), wherein in the total (100 mass %) of (A) to (E), (A) is from 10 to 50 mass %, (B) is from 5 to 35 mass %, (C) is from 15 to 75 mass %, (D) is from 1 to 12 mass %, and (E) is from 0.1 to 5 mass %, is used.

Photocurable composition and process for producing molded product having fine pattern on its surface

A photocurable composition capable of producing a micropattern-formed product efficiently, which is excellent in physical properties such as heat resistance, chemical resistance, releasability and optical characteristics (transmittance and low refractive index), and a process for producing a micropattern-formed product, capable of highly precisely transferring a micropattern of a mold to its surface are provided. A photocurable composition which comprises from 50 to 98 mass % of a monomer containing no fluorine atom and having a viscosity at 25&#xb0; C. of from 0.1 to 100 mPa&#xb7;s, from 0.1 to 45 mass % of a fluoromonomer, from more than 0.1 to 20 mass % of a fluorinated surfactant and/or a fluoropolymer and from 1 to 10 mass % of a photopolymerization initiator, and contains substantially no solvent. A process for producing a micropattern-formed product comprising a cured product having a micropattern of a mold transferred on its surface, or such a micropattern-formed product integrated with a substrate, which uses the photocurable composition, a substrate and a mold having a micropattern.

Photocurable composition, micropattern-formed product and its production process

To provide a photocurable composition whereby it is possible to obtain a cured product provided with both release property and high refractive index, and a process whereby it is possible to produce a molded product having a high refractive index and having on its surface a fine pattern having a reverse pattern of a mold precisely transferred. The photocurable composition comprising from 61 to 90 mass % of a compound (A) having a refractive index of at least 1.55 at a wavelength of 589 nm before curing and having at least two (meth)acryloyloxy groups, from 2 to 15 mass % of a compound (B) having fluorine atoms and at least one carbon-carbon unsaturated double bond (provided that compound (A) is excluded), from 5 to 35 mass % of a compound (C) having one (meth)acryloyloxy group (provided that compound (B) is excluded), and from 1 to 12 mass % of a photopolymerization initiator (D) (provided (A)+(B)+(C)+(D)=100 mass %).

To provide a photocurable material which can form a cured product having a high transparency and a high refractive index, a process for producing the material easily, and an article having a high transparency and a high refractive index. The photocurable material is obtained by a production process comprising (i) a step of reacting a polymerizable component (A) comprised of at least one type of a compound (a) having a (meth)acryloyloxy group, and a compound (B) having a mercapto group and a carboxy group to obtain a surface modifier (C) which has the carboxy group derived from the compound (B) at a terminal, (ii) a step of modifying the surface of inorganic fine particles (D) with the surface modifier (C) to obtain surface-modified inorganic fine particles (E), and (iii) a step of obtaining a photocurable material which contains the surface-modified inorganic fine particles (E), a polymerizable component (F) comprised of at least one type of a compound (f) having a (meth)acryloyloxy group, and a photopolymerization initiator (G).

Process for producing photocurable material, photocurable material and article

To provide a photocurable composition from which a cured product excellent in mold release characteristics and mechanical strength can be obtained, and a method for producing a molded product excellent in durability, with a fine pattern having a reverse pattern of a mold precisely transferred on its surface. A photocurable compositioncomprising from 15 to 60 mass % of a compound (A) which is an aromatic compound having at least two rings or an alicyclic compound having at least two rings and which has two (meth)acryloyloxy groups, from 5 to 40 mass % of a compound (B) having a fluorine atom and having at least one carbon-carbon unsaturated double bond (excluding the compound (A)), from 10 to 55 mass % of a compound (C) having one (meth)acryloyloxy group (excluding the compound (B)) and from 1 to 12 mass % of a photopolymerization initiator (D) (provided that (A)+(B)+(C)+(D)=100 mass %) is used.

Photocurable composition and method for producing molded product with fine pattern

To provide an imprinting mold, of which a coating layer formed on its surface is hardly susceptible to peeling, and a process for its production. An imprinting mold comprising a mold body and a coating layer made of a release agent, formed on the surface of the mold body, wherein the release agent contains a compound of the following formula (1), and a process for its production: wherein R is Rf&#x2014;X&#x2014;, both R are the same group, Rf is a perfluoroalkyl group, X is at least one member selected from &#x2014;(OCF)&#x2014;, &#x2014;(OCF)&#x2014; and &#x2014;(OCF)&#x2014;, provided that the sum of such units is at least 1, Y is an organic group, is an average of n is from 2 to 10, Z is &#x2014;Si(R)(R), Ris a hydroxyl group or a hydrolysable group, Ris a hydrogen atom or a hydrocarbon group, and m is from 1 to 3.

Imprinting mold and process for its production

A mold and a process for producing a base material having a transferred micropattem, wherein the mold comprises a transparent substrate having chemical bonds resulting from functional groups (x) on a surface on which an interlayer (A) is formed, the interlayer (A) present between the surface of the transparent substrate and a surface layer (B) which has a micropattem for molding a photocurable resin, wherein interlayer (A) is a layer made of a fluoropolymer (1) which is a fluoropolymer having a fluorinated alicyclic structure in its main chain and which has reactive groups (y) reactive with functional groups (x), and surface layer (B) is a layer made of a fluoropolymer (2) which is a fluoropolymer having a fluorinated alicyclic structure in its main chain and which has substantially no reactive groups (y).

Mold, and process for producing base material having transferred micropattern

To provide a fluoropolymer suitable for use as a base polymer for resist materials for excimer lasers having a wavelength of 250 nm or shorter. A fluoropolymer having a monomer unit formed by cyclopolymerization of a fluorinated diene compound represented by the following formula (3),CF&#x2550;CFCF&#x2014;C(CF)(R)&#x2014;CHCH&#x2550;CH&#x2003;&#x2003;(3)wherein Ris either a hydroxyl group blocked by &#x2014;CHR&#x2014;O&#x2014;Ror an organic group having the hydroxyl group, and Ris a cyclic saturated hydrocarbon such as a cycloalkyl group which may have a substituent, or an organic group having the cyclic saturated hydrocarbon.

Fluoropolymer

To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg. A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1):CFR&#x2550;CR&#x2014;Q&#x2014;CR&#x2550;CHR&#x2003;&#x2003;(1)wherein each of Rto Rwhich are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.

Fluorinated compound, fluoropolymer and process for its production

To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg. A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1):CFR&#x2550;CR-Q-CR&#x2550;CHR&#x2003;&#x2003;(1)wherein each of Rto Rwhich are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.

Resist composition

A resist composition containing a fluoropolymer, an acid-generating compound and an organic solvent, a resist film, and methods for making thereof.

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Yokohama, Japan

Yasuhide Kawaguchi